Positive type photosensitive polyimide resin composition

    公开(公告)号:JP4450136B2

    公开(公告)日:2010-04-14

    申请号:JP2000364293

    申请日:2000-11-30

    摘要: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition developable with an aqueous alkali solution and excellent in adhesion to a substrate and developability. SOLUTION: The positive photosensitive polyimide resin composition contains 1-50 pts.wt. polyimide precursor of formula 2 based on 100 pts.wt. solvent-soluble polyimide of formula 1 and 1-100 pts.wt. o-quinonediazido compound based on 100 pts.wt., in total, of the polyimide and the polyimide precursor. In the formulae 1 and 2, R1 and R3 are each a divalent organic group, each of 1-90 mol% of plural symbols R1 is a divalent organic group having one or more groups selected from the group comprising phenolic hydroxyl, carboxyl, thiophenol and sulfone groups, the number of each of the selected groups is one or more, each of 10-99 mol% of plural symbols R1 is a divalent organic group having no phenolic hydroxyl, carboxyl, thiophenol or sulfone group and R2 and R4 are each a tetravalent organic group constituting a tetracarboxylic acid and its derivative.

    Polyimide precursor and polyimide, as well as a liquid crystal cell for alignment treating agent

    公开(公告)号:JP4171543B2

    公开(公告)日:2008-10-22

    申请号:JP24977098

    申请日:1998-09-03

    IPC分类号: C08G73/10 G02F1/1337

    摘要: PROBLEM TO BE SOLVED: To obtain a liquid crystal alignment film which has a slant alignment angle being low and stable against heat treatment and, after being rubbed, can uniformly align a liquid crystal by using a polyimide precursor containing diamine residues of a specified structure and having a reduced viscosity in a specified range. SOLUTION: The polyimide precursor has repeating units represented by formula I and obtained by polymerizing a tetracarboxylic acid derivative with a diamine. In formula I, R1 is a tetracarboxylic acid residue; and R2 is a diamine residue and is represented by formula II (wherein R3 and R4 are each independently a halogen or a 1-6C linear or branched lower alkyl or alkoxyl group; X1 and X2 are each independently oxygen or sulfur; n1 is an integer of 1-18; and n2 and n3 are each independently an integer of 0-2). This precursor has a reduced viscosity of 0.05-3.0 dl/g (in N-methylpyrrolidone in a concentration of 0.5 g/dl at 30 deg.C).