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公开(公告)号:JP4236338B2
公开(公告)日:2009-03-11
申请号:JP17687699
申请日:1999-06-23
申请人: 日産化学工業株式会社 , 財団法人相模中央化学研究所
IPC分类号: C07F7/10 , C08G69/42 , C08G73/10 , G02F1/1337
摘要: PROBLEM TO BE SOLVED: To obtain a new diamine compound containing a specific silphenylene residue, having excellent solubility in solvents and orientation uniformity of a polymer chain by rubbing, and useful as a liquid crystal orienting agent. SOLUTION: A diamine compound containing a silphenylene group expressed by formula I (R1 to R4 are each a 1-6C alkyl or phenyl; X1 and X2 are each an ether bond, or the like; (m) is 2-20), e.g. a compound of formula II. The compound of formula I can be produced by reacting a silphenylene compound of formula III with an alkenyl compound of formula IV in the presence of a hydrosilylation catalyst (e.g. platinum) preferably in a solvent (e.g. hexane) at 40-100 deg.C in an inert gas atmosphere (e.g. argon) and reducing the nitro group of the produced dinitro compound at -100 to +150 deg.C preferably in a solvent (e.g. an alcohol).
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公开(公告)号:JP3893659B2
公开(公告)日:2007-03-14
申请号:JP5017597
申请日:1997-03-05
申请人: 日産化学工業株式会社
IPC分类号: G02F1/1337 , C08G73/10
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公开(公告)号:JP4450136B2
公开(公告)日:2010-04-14
申请号:JP2000364293
申请日:2000-11-30
申请人: 日産化学工業株式会社
摘要: PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition developable with an aqueous alkali solution and excellent in adhesion to a substrate and developability. SOLUTION: The positive photosensitive polyimide resin composition contains 1-50 pts.wt. polyimide precursor of formula 2 based on 100 pts.wt. solvent-soluble polyimide of formula 1 and 1-100 pts.wt. o-quinonediazido compound based on 100 pts.wt., in total, of the polyimide and the polyimide precursor. In the formulae 1 and 2, R1 and R3 are each a divalent organic group, each of 1-90 mol% of plural symbols R1 is a divalent organic group having one or more groups selected from the group comprising phenolic hydroxyl, carboxyl, thiophenol and sulfone groups, the number of each of the selected groups is one or more, each of 10-99 mol% of plural symbols R1 is a divalent organic group having no phenolic hydroxyl, carboxyl, thiophenol or sulfone group and R2 and R4 are each a tetravalent organic group constituting a tetracarboxylic acid and its derivative.
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公开(公告)号:JP3912859B2
公开(公告)日:2007-05-09
申请号:JP21956997
申请日:1997-08-14
申请人: 日産化学工業株式会社 , 財団法人相模中央化学研究所
IPC分类号: G02F1/1337 , C08G69/44 , C09K19/56
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公开(公告)号:JPWO2002100949A1
公开(公告)日:2004-09-24
申请号:JP2003503710
申请日:2002-06-11
申请人: 日産化学工業株式会社
IPC分类号: G02F1/1337 , C08G73/10 , C08K5/18 , C08L79/08 , C09K19/56
CPC分类号: G02F1/133723 , C08G73/10 , C08K5/18 , Y10T428/1005 , Y10T428/1018 , Y10T428/1023 , C08L79/08
摘要: ポリイミド系の液晶配向処理剤中に、式(I)で示される構造を含有させる。(ただし、式(I)中のQは単結合または2価の有機基を表し、R1〜R4は芳香族基を表し、R1〜R4は互いに異なっても同じでも良い。)
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公开(公告)号:JP3365563B2
公开(公告)日:2003-01-14
申请号:JP948893
申请日:1993-01-22
申请人: 日産化学工業株式会社
IPC分类号: C08G73/10 , G02F1/1337
CPC分类号: G02F1/133723 , Y10T428/10 , Y10T428/1005 , Y10T428/1023
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公开(公告)号:JP4639471B2
公开(公告)日:2011-02-23
申请号:JP2000575929
申请日:1999-10-06
申请人: 日産化学工業株式会社
IPC分类号: C08G73/10
CPC分类号: C08G73/1039 , C08G73/10
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公开(公告)号:JP4258583B2
公开(公告)日:2009-04-30
申请号:JP4407899
申请日:1999-02-23
申请人: 淳二 城戸 , 日産化学工業株式会社
IPC分类号: H01L51/50 , C08G73/02 , H01B1/12 , H01L51/00 , H01L51/30 , H05B33/12 , H05B33/14 , H05B33/22
CPC分类号: H01B1/128 , C08G73/026 , C08G73/0266 , H01L51/0035 , H01L51/0043 , H01L51/0059 , H01L51/5012 , Y10S428/917
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10.
公开(公告)号:JP4171543B2
公开(公告)日:2008-10-22
申请号:JP24977098
申请日:1998-09-03
申请人: 日産化学工業株式会社 , 財団法人相模中央化学研究所
IPC分类号: C08G73/10 , G02F1/1337
摘要: PROBLEM TO BE SOLVED: To obtain a liquid crystal alignment film which has a slant alignment angle being low and stable against heat treatment and, after being rubbed, can uniformly align a liquid crystal by using a polyimide precursor containing diamine residues of a specified structure and having a reduced viscosity in a specified range. SOLUTION: The polyimide precursor has repeating units represented by formula I and obtained by polymerizing a tetracarboxylic acid derivative with a diamine. In formula I, R1 is a tetracarboxylic acid residue; and R2 is a diamine residue and is represented by formula II (wherein R3 and R4 are each independently a halogen or a 1-6C linear or branched lower alkyl or alkoxyl group; X1 and X2 are each independently oxygen or sulfur; n1 is an integer of 1-18; and n2 and n3 are each independently an integer of 0-2). This precursor has a reduced viscosity of 0.05-3.0 dl/g (in N-methylpyrrolidone in a concentration of 0.5 g/dl at 30 deg.C).
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