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公开(公告)号:JP5096814B2
公开(公告)日:2012-12-12
申请号:JP2007176087
申请日:2007-07-04
申请人: 東京応化工業株式会社
IPC分类号: G03F7/027 , C08F290/06 , G02B5/20 , G03F7/004
摘要: A colored photosensitive composition is provided to improve the balance of sensitivity and solubility and to enhance of the sharpness of pixel edge and adhesion. A colored photosensitive composition comprises a photopolymerizable compound comprising a resin obtained by reacting a reaction product of an epoxy compound and an ethylenically unsaturated carboxylic acid compound with a polybasic acid anhydride; a photopolymerization initiator; and a colorant, wherein the epoxy compound comprises an epoxy compound having a biphenyl structure and an epoxy compound having a cardo structure.
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公开(公告)号:JP5313740B2
公开(公告)日:2013-10-09
申请号:JP2009085710
申请日:2009-03-31
申请人: 東京応化工業株式会社
IPC分类号: G03F7/038 , G02F1/1339 , G03F7/033
摘要: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which allows formation of a spacer having a high breaking strength, a good shape, and good adhesion to a substrate, and to provide a liquid crystal panel having the spacer formed of the photosensitive resin composition. SOLUTION: The photosensitive resin composition contains an alkali-soluble resin (A), a photopolymerizable monomer (B), and a photoinitiator (C). The alkali-soluble resin (A) contains: an alkali-soluble resin (A1) having a structural unit (a1) derived from an unsaturated carboxylic acid and a structural unit (a2) derived from an epoxy group-containing unsaturated compound; and an alkali-soluble resin (A2) having the structural unit (a1) and a structural unit (a3) having a portion polymerizable with the photopolymerizable monomer (B); or an alkali-soluble resin (A3) having structural units (a1), (a2), and (a3). A ratio of the structural unit (a2) to each of alkali-soluble resins (A1) and (A3) is ≥71 mass%. COPYRIGHT: (C)2011,JPO&INPIT
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公开(公告)号:JP5085342B2
公开(公告)日:2012-11-28
申请号:JP2008004922
申请日:2008-01-11
申请人: 東京応化工業株式会社
摘要: PROBLEM TO BE SOLVED: To provide a colored photosensitive resin composition, improved more in ink repellency. SOLUTION: This colored photosensitive resin composition includes: a photopolymerizable compound (A); an ink repellent compound (B); a photopolymerizable initiator (C); and a coloring agent (D), wherein a copolymer obtained by copolymerizing a silicon contained monomer (B1) having an ethylenic unsaturated group and at least one alkoxy group coupled to a silicon atom and a fluorine monomer (B2) copolymerizable with the silicon contained monomer (B1) is used as the ink repellent compound (B). COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号:JP4855312B2
公开(公告)日:2012-01-18
申请号:JP2007082777
申请日:2007-03-27
申请人: 東京応化工業株式会社
摘要: This invention is to provide a photosensitive composition having higher sensitivity. The photosensitive composition comprises a photo-polymerizable compound and a photo-polymerization initiator, wherein the photo-polymerization initiator has a skeleton which can be represented by formula (1) and a light absorbance rate higher than 0.3 at the wavelength of 365 nm. In formula (1), A, B and G are monovalent organic groups, and E is a substituted conjugated ring.
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公开(公告)号:JP4756963B2
公开(公告)日:2011-08-24
申请号:JP2005261219
申请日:2005-09-08
申请人: 東京応化工業株式会社
IPC分类号: G02B5/20 , C08F299/02 , C08L61/14 , G03F7/038
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公开(公告)号:JP4404330B2
公开(公告)日:2010-01-27
申请号:JP2001001979
申请日:2001-01-09
申请人: 東京応化工業株式会社
IPC分类号: C08F299/02 , G03F7/027 , C08F2/44 , C08F2/50 , C08G59/14
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