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公开(公告)号：JP5325803B2
公开(公告)日：2013-10-23
申请号：JP2010016161
申请日：2010-01-28
Applicant: 株式会社日立ハイテクノロジーズ
Abstract: PROBLEM TO BE SOLVED: To provide a low-contaminated loader capable of restraining adhesion of particles on a sample caused by kicking-up of dust at the time of vacuum evacuation or the like, and a charged particle beam device having the low-contaminated loader. SOLUTION: The low-contaminated loader having a load lock chamber with a branched rough-absorbing piping has a plurality of pressure sensors for detecting pressure of gas flowing in a plurality of exhaust pipes, and a flow rate adjusting mechanism. Vacuum evacuation of the load lock chamber is performed while a flow rate is adjusted so as to make pressure inside the exhaust pipe become equal. The charged particle beam device has the low-contaminated loader. COPYRIGHT: (C)2011,JPO&INPIT
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公开(公告)号：JP5337532B2
公开(公告)日：2013-11-06
申请号：JP2009045032
申请日：2009-02-27
Applicant: 株式会社日立ハイテクノロジーズ
IPC: H01L21/02 , H01L21/677
Abstract: PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus that prevents particles from being flown up due to a pressure gradient while suppressing a time needed for atmosphere release short. SOLUTION: When releasing a load lock chamber to an atmosphere by gas introduction from a feed pipe, the vacuum processing apparatus starts evacuating the load lock chamber using an exhaust pipe when the pressure in the load lock chamber rises up to predetermined first pressure, and stops the evacuation using the exhaust pipe when the pressure in the load lock chamber rises up to second pressure higher than the first pressure. COPYRIGHT: (C)2010,JPO&INPIT
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公开(公告)号：JP5547044B2
公开(公告)日：2014-07-09
申请号：JP2010259352
申请日：2010-11-19
Applicant: 株式会社日立ハイテクノロジーズ
IPC: H01L21/677 , H01J37/20 , H01L21/66
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4.发明专利
公开(公告)号：JP5178495B2
公开(公告)日：2013-04-10
申请号：JP2008324894
申请日：2008-12-22
Applicant: 株式会社日立ハイテクノロジーズ
IPC: H01J37/20 , H01J37/28 , H01L21/66 , H01L21/677
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