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    Composition for high heat-resistant coating, high heat-resistant film and method for producing the same
    1.
    发明专利
    Composition for high heat-resistant coating, high heat-resistant film and method for producing the same 有权
    用于高耐热涂层的组合物，高耐热膜及其制造方法

    公开(公告)号：JP2010242096A

    公开(公告)日：2010-10-28

    申请号：JP2010158111

    申请日：2010-07-12

    Applicant: Dainippon Printing Co Ltd ,  大日本印刷株式会社

    Inventor： ANDO MASAYUKI ,  IKEGAMI KEI ,  SAKAYORI KATSUYA ,  OGATA NAOYA

    IPC: C09D171/12 ,  C08G65/48 ,  C09D171/00 ,  C09D181/06 ,  C09D201/02

    Abstract: PROBLEM TO BE SOLVED: To provide a composition for a high heat-resistant coating, having excellent workability, by imparting solubility in an organic solvent to a polymer which has an aromatic ring originally insoluble in the organic solvent in the skeleton, which has high rigidity and is excellent in heat resistance (thermal decomposition temperature, thermal expansion coefficient, glass transition temperature, etc.), mechanical strength (modulus of elasticity, hardness of coating, etc.), chemical resistance, water resistance, and so on, and to provide a high heat-resistant film, and a method for producing the same. SOLUTION: The composition for a heat-resistant coating includes an aromatic resin which is formed by introducing a sulfonic acid group and/or a salt of a sulfonic acid group, or a sulfinic acid group and/or a salt of a sulfinic acid group as a substituent to one or more aromatic resins which is/are selected from aromatic polyethers and aromatic polysulfones. Contents of the sulfonic acid group and/or the sulfinic acid group is 1-30 wt.% with respect to the weight of the resin as a whole, and the resin is soluble in organic solvents. The composition for the high heat-resistant coating including the resin is thermally stable at temperatures up to about 280°C, and when the temperature is raised so as to exceed about 300°C, occurrence of SO 2 is recognized and weight reduction is observed. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 解决的问题：为了提供具有优异的加工性的高耐热涂层组合物，通过赋予有机溶剂中对骨架中最初不溶于有机溶剂的芳环的聚合物的溶解度，其中 具有高刚性，耐热性（热分解温度，热膨胀系数，玻璃化转变温度等），机械强度（弹性模量，涂布硬度等），耐化学性，耐水性等优异性 ，并提供高耐热性膜及其制造方法。 解决方案：用于耐热涂层的组合物包括通过引入磺酸基团和/或磺酸基团或亚磺酸基团和/或亚磺酸盐的磺酸基和/或其盐形成的芳族树脂 酸基作为选自芳族聚醚和芳族聚砜的一种或多种芳族树脂的取代基。 相对于树脂整体的重量，磺酸基和/或亚磺酸基的含量为1-30重量％，树脂可溶于有机溶剂。 包括树脂的高耐热涂层组合物在高达约280℃的温度下是热稳定的，并且当温度升高至超过约300℃时，SO 2 被认可，并且观察到体重减轻。 版权所有（C）2011，JPO＆INPIT

    Cell culture membrane, kit for cell culture, method for producing cell culture membrane, and method for culturing cell stereoscopically
    2.
    发明专利
    Cell culture membrane, kit for cell culture, method for producing cell culture membrane, and method for culturing cell stereoscopically 审中-公开
    细胞培养膜，细胞培养用试剂盒，细胞培养膜的制造方法以及培养细胞立体异构体的方法

    公开(公告)号：JP2010200620A

    公开(公告)日：2010-09-16

    申请号：JP2009046690

    申请日：2009-02-27

    Applicant: Dainippon Printing Co Ltd ,  大日本印刷株式会社

    Inventor： OGATA NAOYA ,  SUZUKI YUKARI ,  TAKAHASHI YOICHI ,  KURODA MASATOSHI

    IPC: C12N5/07 ,  A61L27/00

    Abstract: PROBLEM TO BE SOLVED: To provide a biocompatible cell culture membrane which is produced by using a deoxyribonucleic acid as a natural resource. SOLUTION: The cell culture membrane includes a deoxyribonucleic acid ionically-crosslinked by an organic polyvalent cation. There is disclosed a cell culture membrane in which the organic polyvalent cation is preferably an organic divalent or more valent cation. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 待解决的问题：提供通过使用脱氧核糖核酸作为天然资源制备的生物相容性细胞培养膜。 解决方案：细胞培养膜包括通过有机多价阳离子离子交联的脱氧核糖核酸。 公开了有机多价阳离子优选为有机二价以上的阳离子的细胞培养膜。 版权所有（C）2010，JPO＆INPIT

    Composition for alignment layer and method of manufacturing optical element using same
    3.
    发明专利
    Composition for alignment layer and method of manufacturing optical element using same 审中-公开

    公开(公告)号：JP2004206102A

    公开(公告)日：2004-07-22

    申请号：JP2003413974

    申请日：2003-12-11

    Applicant: Dainippon Printing Co Ltd ,  大日本印刷株式会社

    Inventor： KIYOHARA YOSHIKO ,  NAKAMURA RUNA ,  OGATA NAOYA

    IPC: G02B5/30 ,  C08F2/44 ,  C08F251/00 ,  C08F290/00 ,  C08J7/04 ,  C08L1/00 ,  C08L3/00 ,  C08L5/00 ,  C09K19/00

    CPC classification number: G02B5/3016 ,  Y10T428/1005

    Abstract: PROBLEM TO BE SOLVED: To provide a composition for an alignment layer, which is applicable to a plastics support material and forms the alignment layer superior in adhesion to an optical function layer (liquid crystal layer) and which is used to cause a liquid crystalline compound in the liquid crystal layer to be easily aligned by its alignment control force by rubbing treatment of the surface of the alignment layer and which forms the alignment layer being superior in adhesion to a support material and in durability and to provide a method of manufacturing an optical element using the same. SOLUTION: The composition for the alignment layer is used for manufacturing an optical element comprising a plastics support material 1, an alignment layer 2, and a one or more-layered optical function layer 3 consisting of the liquid crystalline compound and contains at least a nonionic water-soluble etherificated polysaccharides (A) and water and/or a lower alcoholic solvent (B). Hydroxyethyl cellulose, hydroxypropylmethyl cellulose, or methyl cellulose may be used as the nonionic water-soluble etherificated polysaccharides. COPYRIGHT: (C)2004,JPO&NCIPI

    CELL CULTURE SUBSTRATE
    7.
    发明专利
    CELL CULTURE SUBSTRATE 失效

    公开(公告)号：JPH06335381A

    公开(公告)日：1994-12-06

    申请号：JP12759393

    申请日：1993-05-28

    Applicant: DAINIPPON PRINTING CO LTD

    Inventor： AOKI TAKASHI ,  OGATA NAOYA ,  KUMAKURA KOUNOSUKE

    IPC: C12M1/22 ,  C12M3/00

    Abstract: PURPOSE:To obtain a cell culture substrate capable of retaining its adsorption performance for cells as well as cultured cell performance, by providing the surface of a substrate with a polymeric film through electrolytic polymerization to ensure cells to be stably adsorbed onto the substrate surface and cultured. CONSTITUTION:The surface of a glass substrate is first provided with an electrically conductive transparent film such as of ITO or tin oxide by sputtering technique, and an electrolytically polymerized film of polypyrrole is then grown on the transparent film by making a constant current electrolysis 2.1mA/cm in current density for an aqueous solution prepared by adding 0.1M of pyrrole and 0.05M of sodium chloride as supporting electrolyte. The resultant substrate is then dipped in a 70% aqueous ethanol solution to carry out through washing with sterilization, and dried in a clean bench, thus obtaining the objective cell culture substrate having the above-mentioned advantages.

    INFORMATION RECORDING MEDIUM
    9.
    发明专利
    INFORMATION RECORDING MEDIUM 失效

    公开(公告)号：JPH01166987A

    公开(公告)日：1989-06-30

    申请号：JP32592787

    申请日：1987-12-23

    Applicant: DAINIPPON PRINTING CO LTD

    Inventor： OGATA NAOYA ,  KOMORI TETSUO

    IPC: B41M5/26 ,  G11B7/24 ,  G11B7/244

    Abstract: PURPOSE:To obtain an information recording medium capable of recording or reproducing optical information, by providing a recording layer composed of dithiolate nikel complex having alkyl ammonium as a counter ion. CONSTITUTION:A recording layer 2 composed of dithiolate nikel complex having alkyl ammonium expressed by the formula (1) as a counter ion, is provided. In the formula (1), R1, R2, R3 and R4 of alkyl ammonium, which becomes counter cathions, are composed of an alkyl group having 1-30 carbon atoms. and, at least, one of R1-R4 is preferably a long chain alkyl having 10-22 carbon atoms. from a stand point wherein it becomes easy to be dissolved in solvent for coating. Besides, X1 and X2 in a counter anion complex are a straight chained or branched alkyl group having 5-30 carbon atoms. or hydrogen bonded to position 4, and X3 and X4 are hydrogen, alcoxy group having 1-12 carbon atoms., fluorine, chlorine, or bromine bonded to position 3 or 4.

    IONIZING RADIATION SENSITIVE NEGATIVE TYPE RESIST
    10.
    发明专利
    IONIZING RADIATION SENSITIVE NEGATIVE TYPE RESIST 失效

    公开(公告)号：JPS6091350A

    公开(公告)日：1985-05-22

    申请号：JP19979283

    申请日：1983-10-25

    Applicant: DAINIPPON PRINTING CO LTD

    Inventor： OGATA NAOYA ,  SANAI KOUHEI ,  OGUCHI KIYOSHI ,  NAKADA TOMIHIRO ,  TAKAHASHI YOUICHI

    IPC: G03F7/004 ,  C08F8/00 ,  C08F8/28 ,  G03F7/038 ,  H01L21/027

    Abstract: PURPOSE:To improve resistance to dry etching by using a polymer having acetal structure at the specific side chain. CONSTITUTION:Titled resist is formed of the polymer which consists of the constituting unit having acetal structure at the side chain expressed by the formula I (in which R is a hydrogen atom or alkyl group, R is the residual hydrocarbon group of aldehyde or ketone, m is >=1 integer indicating the length of methylene chain, n is 1 or 2) and has 10,000-1,000,000molwt. or the copolymer which contains such constituting unit and has the same molwt. or a mixture composed of such polymer and other polymers. R includes -CH2-, -C(CH3)2-, -CO-, -CH(C6H5R)-, etc. and contains preferably an arom. group in order to have resistance to dry etching. The resist is sensitive to ionizing radiations such as electron rays, soft X-rays and ion beam.

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