公开(公告)号：JP2008198405A

公开(公告)日：2008-08-28

申请号：JP2007029937

申请日：2007-02-09

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KITSUKI HIROHIKO ,  ITO HIROYUKI

IPC: H01J37/147 ,  H01J37/28

Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope that prevents an inspection time from being extended due to vertical vibration of a sample when obtaining a two-dimensional image by irradiating the sample with an electron beam inclined with respect to the perpendicular direction of the sample.
SOLUTION: The scanning electron microscope is provided with: a height measurement means which measures a height displacement amount of a sample stage; a microprocessor which calculates a displacement amount of an electron-beam irradiation position with respect to a sample from the height displacement amount and an inclination angle of the electron beam so as to transmit a control signal of the electron beam; and a beam position correction means that corrects a horizontal irradiation position of the electron beam by a beam deflection means on the basis of the control signal from the microprocessor.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种扫描电子显微镜，其通过用相对于垂直方向倾斜的电子束照射样品来获得二维图像时，由于样品的垂直振动而防止检查时间延长 样品的方向。 解决方案：扫描电子显微镜设有：测量样品台高度位移量的高度测量装置; 从电子束的高度位移量和倾斜角度计算相对于样品的电子束照射位置的位移量的微处理器，以便传输电子束的控制信号; 以及光束位置校正装置，其基于来自微处理器的控制信号，通过光束偏转装置校正电子束的水平照射位置。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004333210A

公开(公告)日：2004-11-25

申请号：JP2003126646

申请日：2003-05-01

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KITSUKI HIROHIKO ,  SUZUKI NAOMASA ,  KUROSAKI TOSHISHIGE

IPC: G01N23/225 ,  H01J37/22 ,  H01J37/252

Abstract: PROBLEM TO BE SOLVED: To accurately analyze the composition of foreign matter or a defect on a specimen. SOLUTION: This electron beam analyzer is equipped with a secondary electron detector for detecting secondary electrons generated from the specimen by electron beam irradiation, a specimen image forming part for forming a specimen image based on an output of the electron detector, and an X-ray detector for detecting X rays generated from the specimen by the electron beam irradiation. Element analysis on foreign matter/defect is performed by using the X-ray detector to detect X rays generated when irradiating electron rays to the foreign matter/defect existing on a surface of the specimen. The shape of the foreign matter or defect 37 is extracted to set an electron beam irradiation area 38 within the shape. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2006294301A

公开(公告)日：2006-10-26

申请号：JP2005110082

申请日：2005-04-06

Applicant: Hitachi High-Technologies Corp ,  株式会社日立ハイテクノロジーズ

Inventor： KITSUKI HIROHIKO ,  AOKI KAZUO ,  SATO MITSUGI

IPC: H01J37/10 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/263 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2809

Abstract: PROBLEM TO BE SOLVED: To provide a scanning electron microscope digitally processing image signals obtaining the deepest depth of focus and the best resolution in accordance with observation magnification.
SOLUTION: The scanning electron microscope is provided with a means of changing optical angles of aperture by changing a plurality of converging lenses and aperture hole diameters, and changes electron beam angles of aperture in accordance with a visual field range equivalent to one pixel, a so-called pixel size.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种扫描电子显微镜，以根据观察倍率数字处理获得最深的深度和最佳分辨率的图像信号。 解决方案：扫描电子显微镜设置有通过改变多个会聚透镜和孔径直径来改变光学角度的装置，并且根据相当于一个像素的视场范围改变光圈的电子束角度 ，所谓的像素大小。 版权所有（C）2007，JPO＆INPIT