Abstract:
PROBLEM TO BE SOLVED: To accurately and rapidly evaluate the degree of edge roughness from an SEM observation image of a fine line pattern with much noise, by calculating the contribution of the random noise of an apparatus, of a measured index of roughness, based on one image data item and calculating the degree of edge roughness actually existing in a pattern by subtracting the roughness caused by the apparatus from a measurement value of the edge roughness index. SOLUTION: A quantity (dispersion value) of a distribution of an edge position due to random noise is reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method and an apparatus of calculating and evaluating the level of roughness actually present in a pattern, for precisely and quickly evaluating the level of edge roughness from a SEM observation image of a fine line pattern having many noises, by calculating contribution of random noise of the apparatus on the basis of image data of one image and subtracting the roughness originated in the apparatus from a measurement value of an edge roughness index, from among the measured edge roughness indexes. SOLUTION: A quantity (or dispersion value) of fluctuation of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined to be due to noise. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To compute a matching degree with which it is possible to correctly detect an object (it is possible to decide whether the object has been detected) even when the object corresponding region of an input image is deformed compared with the object region of a template image, or even when a noise is superimposed on the input image. SOLUTION: A matching degree computing device is configured to compare an input image with the template image of an object, and to compute a matching degree between the input image and the template image, and provided with: a deforming means for deforming the input image so as to be matched to the template object region; and a means for computing a matching degree between the deformed input image and the template image. The deforming means is provided with: a means for shaping a non-background region to the form of the template object region in the object corresponding region of the input image; and a processing means for setting the non-background region contacting with the template object corresponding region so that the non-background region has no substantial impact on the matching degree in the object non-corresponding region of the input image. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a pattern measuring technique capable of measuring nondestructively, accurately and quantitatively a cross-sectional shape, over from a normal taper to a reverse taper, even in any type of patterns. SOLUTION: A distribution of a reflection electron or secondary electron intensity is processed from a control system of a scanning microscope and an adjacent terminal, and a shape of an area expressing the vicinity of an edge is digitalized to calculate a tapering tendency based on a result thereof. A shape of an area in the vicinity of a pattern edge is digitized, based on an image data of a sky photograph obtained by the scanning microscope, to evaluate the tapering tendency of the cross-sectional shape. The tendency of the edge in the reverse, vertical or normal taper, or the like, can be evaluated, based only a sky observation result. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To readily measure in distinction from local roughness, by stably measuring a line width. SOLUTION: From a plurality of same patterns existing in a screen a mean pattern shape is calculated, and pattern information at each position and the mean pattern information are compared. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a method and a device of observing or measuring a specimen at high speed with high accuracy while limiting the impact of beam diameter increase of an electron beam due to image shift.SOLUTION: When scanning a region smaller than a predetermined scanning width with an electron beam, scrolling is performed using image shift when a target irradiation position of the electron beam on a specimen is within a second range smaller than a first range capable of controlling the image shift, otherwise stage movement is performed. Since the scrolling amount can be increased by relative image shift for stage movement under conditions not affected by the beam diameter, observation and measurement of a specimen can be carried out at high speed with high accuracy.
Abstract:
PROBLEM TO BE SOLVED: To specify the cause simply and accurately using an SEM image when a failure occurs in the SEM image due to the influence of a magnetic field or a vibration in an apparatus or from the outside of the apparatus in a scanning electron microscope, and to obtain a measurement method where the roughness of the pattern of an SEM image has no impact on the measurement accuracy.SOLUTION: One dimensional scanning is performed in the scanning line direction (X direction) by nullifying the scanning gain in the Y direction when acquiring the SEM image, and a two-dimensional image is created by arranging the image information obtained by the scanning in the Y direction in time series. A magnetic field, a vibration, or the like, included in the image is measured by acquiring the deviation amount data of the two-dimensional image by a correlation function, and then performing frequency analysis of that data.
Abstract:
PROBLEM TO BE SOLVED: To provide an image formation device and a computer program capable of extracting information on distortion of charged particle beam in a scanning area.SOLUTION: An image formation device integrates image data obtained by a charged particle beam device. The image formation device calculates a first information on an amount of change in the feature amount that changes according to the beam irradiation time of charged particle beam, a second information on an amount of change in the feature amount before and after the change in the beam's scanning direction, and/or a third information on a pattern displacement in a plurality of images before and after the change in the beam's scanning direction, from the plurality of images with different scanning directions in the charged particle beam device. In addition, a computer program for causing an arithmetic unit to execute the above-described processing is provided.
Abstract:
PROBLEM TO BE SOLVED: To provide an overlay error measurement device capable of accurately measuring an overlay error even in a case where a lower-layer pattern is disposed under a thin film and unable to secure an adequate amount of signal quantity.SOLUTION: An overlay error measurement device includes an arithmetic processing unit for measuring a pattern formed on a specimen on the basis of a signal waveform obtained by a charged particle beam device. Further, the arithmetic processing unit performs: using a partial waveform obtained on the basis of partial extraction of a signal waveform to calculate correlation therewith; forming a correlation profile 501 indicating the correlation; and measuring an overlay error using the correlation profile 501.
Abstract:
PROBLEM TO BE SOLVED: To provide a scanning electron microscope which realizes highly precise focus adjustment even under an observation condition with a great depth of focus.SOLUTION: A plurality of aperture holes of different diameters are formed on an aperture plate that eliminates an unnecessary area of a primary electron beam, and the aperture holes are switched to control an aperture angle of the primary electron beam that passes through the aperture holes without changing lens conditions of a converging lens and an objective lens. A condition is set to determine a resolution to be high and a depth of focus to be small. In this manner, focus adjustment precision is improved.