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    ELECTRON GUN OF ELECTRON BEAM APPARATUS
    3.
    发明专利
    ELECTRON GUN OF ELECTRON BEAM APPARATUS 失效

    公开(公告)号：JPH02186544A

    公开(公告)日：1990-07-20

    申请号：JP411189

    申请日：1989-01-11

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： YAMAJI SHIGERU ,  MURAKAMI EISHIN

    IPC: H01J37/06

    Abstract: PURPOSE:To compact the structure of the apparatus in the title by a method wherein a central conductor is embedded into an insulator to maintain air tightness between a high temperature section in the vicinity of a cathode and exterior while the insulator is integrally structured wherein the inner part is composed of ceramic and its outer part is composed of cast resin. CONSTITUTION:A cathode 9 placed in a vacuum chamber 2, a central conductor 16 for connecting the cathode 9 to a cable 19 through an opening formed on the vacuum chamber 2 and an insulator 15 mounted on the periphery 6 of the opening for embedding and insulating the central conductor 16 inside are provided wherein a ceramic material 17 is used for the inner and a cast resin material 18 is used for the outer respectively of the insulator 15. In other words, by only mounting the outer periphery of the insulator 15 on the periphery 6 of the opening of the vacuum chamber 2, the central conductor 16 can be led to the exterior, enabling its connection with the cable 19 and maintaining air tightness between a high temperature section in the vicinity of the cathode 9 and the exterior in the vacuum chamber 2 with adhesion between the insulator 15 and the central conductor 16. This enables a structure to be compacted and simplified.

    ELECTRON BEAM DEVICE
    4.
    发明专利
    ELECTRON BEAM DEVICE 失效

    公开(公告)号：JPS6417363A

    公开(公告)日：1989-01-20

    申请号：JP17303687

    申请日：1987-07-13

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： IWAMI TAIZO ,  MURAKAMI EISHIN ,  YASUNAGA MASASHI

    IPC: H01J37/147 ,  H01L21/027 ,  H01L21/30

    Abstract: PURPOSE:To make a beam irradiating position locatable in a highly accurate manner by setting up a ring, consisting of a ferromagnetic material, in at least either side of both upper and lower parts of a deflecting lens. CONSTITUTION:In both upper and lower parts or either side of a deflecting lens 6 with a ferromagnetic material core, there is provided with a deflecting lens system which has deliberately set up a ferromagnetic ring 21 with a hysteresis characteristic. This magnetic material ring 21 is passed through a leakage magnetic field of the deflecting lens 6, generating a residual magnetic field 25 in the opposite direction to another residual magnetic field 24 of a deflector in a beam passage, and it negates an error of a beam irradiating position by the residual magnetic field attributable to the hysteresis characteristic. With this constitution, such a deflecting lens system that is high in beam irradiating position accuracy is realizable.

    ELECTRON BEAM PROCESSING APPARATUS
    5.
    发明专利
    ELECTRON BEAM PROCESSING APPARATUS 失效

    公开(公告)号：JPS6321734A

    公开(公告)日：1988-01-29

    申请号：JP16456486

    申请日：1986-07-15

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： MURAKAMI EISHIN ,  MARUYAMA TOSHIRO ,  YASUNAGA MASASHI

    IPC: B23K15/00 ,  B23K15/02 ,  H01J37/06 ,  H01J37/248

    Abstract: PURPOSE:To prevent beam focusing position from changing even if the thermal electron emitting performance of a cathode changes due to the fluctuation of the cathode heating characteristic or the aging, by regulating the temperature of the cathode so that bias voltage is kept constant against the specified acceleration voltage and the beam current. CONSTITUTION:Acceleration voltage VA is detected by an acceleration voltage detection resistor 14, beam current IK is detected by a beam current detection resistor 10, and bias voltage VC is detected by a bias voltage transmission circuit 15, a 2nd optical fiber 16 and a bias voltage receiver circuit 17 and those detected data are fed to a cathode temperature control circuit 18. VA and VC fed to the cathode temperature control circuit 18 are subjected to calculation by an attenuator 20, an adder 21, function operator 22 and an amplifier 23 and are compared with the measurement result of beam current Ik in a PID circuit 24. If the thermal electron emitting has decreased, the PID circuit 24 increases the output of a heating power source 7 of a thermal cathode 1 through a 3rd optical fiber 19 to increase the cathode temperature.

    ELECTRON BEAM MACHINING APPARATUS
    6.
    发明专利
    ELECTRON BEAM MACHINING APPARATUS 失效

    公开(公告)号：JPS6224546A

    公开(公告)日：1987-02-02

    申请号：JP16292485

    申请日：1985-07-25

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： YABUNAKA FUMIHARU ,  MURAKAMI EISHIN

    IPC: H01J37/06 ,  H01J37/248

    Abstract: PURPOSE:To quicken response upon occurrence of electron beam by quickly lowering the bias voltage on the basis of another setting signal upon occurrence of electron beam and switching to normal PID control upon start of production of electron beam. CONSTITUTION:Upon function of switch 23 on the basis of electron beam ON command under OFF condition of electron beam where the bias voltage is higher than cut-off voltage, the input of PID controller 16 is separated from the output of adder 15 through said switch and connected to temporal output signal setter 24 to set the temporal output signal to the maximum electron beam current level for dropping the bias voltage with minimum time. Consequently, the bias voltage will start dropping quickly with correspondence to occurrence of the maximum electron beam current on the basis of electron beam ON command to produce an electron beam 4 upon droppage below cut-off voltage while said switch 23 will function when the electron beam 4 will exceed over 0mA to control the bias voltage such that the setting current and the electron beam 4 level will match.

    X RAY DETECTION ELEMENT FOR WELD LINE DETECTOR
    7.
    发明专利
    X RAY DETECTION ELEMENT FOR WELD LINE DETECTOR 失效

    公开(公告)号：JPS58174881A

    公开(公告)日：1983-10-13

    申请号：JP5869682

    申请日：1982-04-06

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： YABUNAKA FUMIHARU ,  MURAKAMI EISHIN

    IPC: G01T7/00 ,  G01T1/02 ,  G01T1/24

    Abstract: PURPOSE:To improve the operating rate while facilitating the mounting or removing of a shield wire by integral assembly and construction of an X ray detection element with a coaxial connector. CONSTITUTION:A coaxial connector 20 is supported on a metal outer cylinder 21 with a coaxial terminal 22 through an insulator 23 and a metal container 2 is connected thereto 2 to house an X ray detection element 4. The X ray detection element 4 converts radiation noise such as light to an electric signal in response to X ray alone transmitting a shield plate 3. The electric signal is transmitted to a signal processor from the coaxial connector 20 in the state as completely shielded thereby enabling the drawing thereof at a high signal- to-noise ratio though it is of minute value.

    DETECTOR FOR WELD LINE
    8.
    发明专利
    DETECTOR FOR WELD LINE 失效

    公开(公告)号：JPS58173089A

    公开(公告)日：1983-10-11

    申请号：JP5769182

    申请日：1982-04-05

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： MURAKAMI EISHIN ,  YASUNAGA MASASHI

    IPC: H01J37/315 ,  B23K15/00

    Abstract: PURPOSE:To provide a titled device which does not break down thermally a material to be welded and can be constituted inexpensively by the constitution wherein a weld line is scanned by superposing the oscillation waveform of a frequency sufficiently higher than the basic signal of the deflection signal of an electron beam on said deflection signal. CONSTITUTION:The detection signal obtained by scanning an electron beam on a material to be welded by a periodic or intermittent signal and detecting the reflected ray generated from the surface of said material by the scanning electron beam and the current signal of an X-axis and a Y-axis inputted to a deflection coil for deflecting said scanning beam are inputted to a signal processing unit so as to be processed therewith, whereby the weld line of electron beam welding is detected. The current signal of the high frequency from a high frequency transmitter is inputted to the X-axis of one deflection signal of the electron beam and an ordinary sine wave signal is inputted to the other Y-axis in the above-mentioned method, and both signals are superposed to deflect the electron beam, whereby the locus of the scanning electron beam is made equivalently wide in line, the current density is decreased and heating power is decreased while the resolving power for the position in the Y-axis direction is kept unvaried.

    ELECTRON BEAM IRRADIATION DEVICE
    9.
    发明专利
    ELECTRON BEAM IRRADIATION DEVICE 失效

    公开(公告)号：JPH06163380A

    公开(公告)日：1994-06-10

    申请号：JP30694292

    申请日：1992-11-17

    Applicant: MITSUBISHI ELECTRIC CORP

    Inventor： IWAMI TAIZO ,  YAMANE YOSHIO ,  MURAKAMI EISHIN

    IPC: G03F7/20 ,  H01L21/027

    Abstract: PURPOSE:To perform a correction of an error amount to be caused in the rotary direction to be generated in a deflection field by the used of a simple constitution and at a low cost while allowing drawing with high accuracy. CONSTITUTION:A rotary correction coil 10 is arranged so as to superimpose a magnetic field in the beam axis direction on a deflected electron beam 2 while controlling the rotary correction coil 10, a deflector 4 and a stage 8 so as to correct an rotary error amount of each field.

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