公开(公告)号：KR1020140045847A

公开(公告)日：2014-04-17

申请号：KR1020120112098

申请日：2012-10-09

申请人： 삼성디스플레이 주식회사

发明人： 이준우 ,  정관욱 ,  김광해 ,  최재범

IPC分类号： H01L51/56 ,  H05B33/10

CPC分类号： H01L51/0014 ,  B23K26/127 ,  B23K26/40 ,  B23K2203/172 ,  B23K2203/30 ,  B23K2203/50 ,  H01L21/67011

摘要： Provided is a laser irradiation apparatus and a method for manufacturing an organic light emitting display device using the same, wherein the laser irradiation apparatus according to one embodiment of the present invention comprises: a chamber in which a panel with an organic layer on a substrate is arranged; a laser oscillator which is arranged outside the chamber and emits a laser beam on the panel in the chamber; and a transparent window which is arranged in the chamber to make the laser beam reach the substrate. And the laser beam removes the organic layer on the substrate.

摘要翻译： 本发明提供一种激光照射装置及其制造方法，其特征在于，根据本发明的一个实施方式的激光照射装置具备：在基板上具有有机层的面板为 安排; 激光振荡器，其布置在所述腔室的外部，并且在所述腔室中的所述面板上发射激光束; 以及布置在腔室中以使激光束到达衬底的透明窗口。 并且激光束去除衬底上的有机层。

公开(公告)号：KR1020140040312A

公开(公告)日：2014-04-03

申请号：KR1020120105778

申请日：2012-09-24

申请人： 주식회사 원익아이피에스

发明人： 임민돈 ,  노일호 ,  김운수 ,  한재병

IPC分类号： H01L21/683 ,  H01L21/205 ,  C23C16/458

CPC分类号： H01L21/67011 ,  H01L21/68742 ,  H01L21/68785

摘要： The present invention provides a substrate processing device which is capable of effectively processing a large thin substrate and a deposition device with the same. To achieve this, the substrate processing device comprises a chamber body with an opening on one side to allow a substrate to access; and a plurality of substrate pins which can be arranged on the chamber body and which include a substrate pin to support the edge of the one tip end of a substrate around the opening, supplied through the opening.

摘要翻译： 本发明提供一种能够有效地处理大型薄基板的基板处理装置和具有该基板处理装置的沉积装置。 为了实现这一点，基板处理装置包括在一侧具有开口以允许基板进入的室主体; 以及可以布置在室主体上并且包括衬底销的多个衬底销，所述衬底销支撑通过开口提供的围绕开口的衬底的一个顶端的边缘。

公开(公告)号：KR1020140038748A

公开(公告)日：2014-03-31

申请号：KR1020120105248

申请日：2012-09-21

申请人： 삼성디스플레이 주식회사

发明人： 진용현 ,  임재하

IPC分类号： H01L51/56

CPC分类号： H01L21/67011 ,  C23C14/042 ,  C23C14/24 ,  C23C14/50 ,  C23C14/568 ,  H01L21/67709 ,  H01L21/6776 ,  H01L27/3244 ,  H01L27/3258 ,  H01L51/0011

摘要： To improve the properties of a deposited film, the present invention provides an organic layer deposition device, an organic light emitting display device, and a method for manufacturing organic light emitting display device, comprising a moving part which fixes a substrate, is formed to move with the substrate, and has a carrier; a first transfer unit which has a receiving groove receiving both sides of the moving part to guide the movement of the moving part with the fixed substrate in a first direction and comprises a guide part including a first receiving part, a second receiving part, and a connection part connecting the first receiving part and the second receiving part; a second transfer unit which moves the moving part, from which the substrate is separated after deposition is complete, in the direction opposite to the first direction; a loading part which fixes the substrate to the moving part; a deposition part which includes a chamber maintained under vacuum and one or more organic layer deposition assemblies depositing an organic layer on the substrate fixed to the moving part transferred from the loading part; and an unloading part which separates the substrate from the moving part after the substrate is completely deposited by passing through the deposition part. The first receiving part of the guide part is arranged more close to the ground than the second receiving part. The first receiving part comprises a lower member, an upper member, and an elastic member disposed between the upper member and the lower member. The moving part moves between the first transfer unit and the second transfer unit. The substrate fixed to the moving part is separated from the organic layer deposition assembly at a predetermined interval while being moved by the first transfer unit.

摘要翻译： 为了提高沉积膜的性能，本发明提供了一种有机层沉积装置，有机发光显示装置和用于制造有机发光显示装置的方法，包括：固定基板的移动部件，以移动 并具有载体; 第一传送单元，其具有容纳槽，其接收所述移动部件的两侧，以沿着第一方向引导所述移动部件与所述固定基板的移动，并且包括引导部件，所述引导部件包括第一接收部件，第二接收部件和 连接部分，连接第一接收部分和第二接收部分; 第二传送单元，其在与所述第一方向相反的方向上移动所述移动部件，所述移动部件从所述移动部件在所述沉积完成之后从所述移动部件分离; 将基板固定在移动部上的装载部; 沉积部分，其包括保持在真空下的室和一个或多个有机层沉积组件，所述有机层沉积组件在固定到从所述装载部分传送的所述移动部件上的所述基板上沉积有机层; 以及在基板通过沉积部分完全沉积之后，将基板与移动部分分离的卸载部件。 引导部分的第一接收部分布置得比第二接收部分更靠近地面。 第一接收部分包括下部构件，上部构件和布置在上部构件和下部构件之间的弹性构件。 移动部件在第一传送单元和第二传送单元之间移动。 固定在移动部件上的基板在被第一转印单元移动的同时以预定间隔从有机层沉积组件分离。

公开(公告)号：KR1020140035818A

公开(公告)日：2014-03-24

申请号：KR1020130104681

申请日：2013-09-02

申请人： 가부시키가이샤 히다치 고쿠사이 덴키 ,  레르 리키드 쏘시에떼 아노님 뿌르 레뜌드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드

发明人： 히로세요시로 ,  미즈노노리카즈 ,  야나기타카즈타카 ,  히가시노카츠코

IPC分类号： H01L21/205

CPC分类号： H01L21/02255 ,  C23C16/24 ,  C23C16/45527 ,  C23C16/45546 ,  C23C16/52 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/67011

摘要： The present invention forms a thin film including preset element like a silicon layer in a low temperature region. The thin film consisting of a preset element group is formed on a substrate by performing preset time a cycle that includes a process of supplying a first raw material including preset element and halogen radical to a substrate; and a process of supplying a second raw material which includes preset element and amino radical, and has the number of ligands including the amino radical in the empirical formula which is less than two, and also is less than the number of ligands including the halogen radical in the empirical formula of the first raw material. [Reference numerals] (AA) Wafer charge; (BB) Boat load; (CC) Pressure adjustment; (DD) Temperature adjustment; (EE) HCDS gas supply; (FF,HH) Remaining gas removal; (GG) SiH_3R gas supply; (II) 1 cycle; (JJ) Step1; (KK) Step2; (LL) Perform a predetermined number of times?; (MM) Purge; (NN) Return to atmospheric pressure; (OO) Boat unload; (PP) Wafer discharge

摘要翻译： 本发明在低温区域形成包含硅层的预置元件的薄膜。 由预设元件组构成的薄膜通过执行预设时间一周期形成在基板上，该周期包括向基板提供包括预设元素和卤素自由基的第一原材料的工艺; 以及提供包含预设元素和氨基的第二原料的方法，并且具有经验式中包含氨基的配体数小于2，并且还小于包括卤素基团的配体数 在第一种原料的经验公式中。 （附图标记）（AA）晶片充电; （BB）船载; （CC）压力调节; （DD）温度调节; （EE）HCDS气体供应; （FF，HH）剩余气体去除; （GG）SiH_3R气体供应; （二）1周期; （JJ）Step1; （KK）Step2; （LL）执行预定次数？ （MM）清洗; （NN）回到大气压; （OO）船卸货; （PP）晶片放电

公开(公告)号：KR1020140016209A

公开(公告)日：2014-02-07

申请号：KR1020130153886

申请日：2013-12-11

申请人： 주식회사 테라세미콘

发明人： 이은호 ,  조병호 ,  김철호 ,  염현진

IPC分类号： H01L21/683 ,  H01L21/205 ,  H01L21/324

CPC分类号： H01L21/6875 ,  H01L21/67011 ,  H01L21/68785

摘要： A supporting unit for a substrate and a substrate processing apparatus using the same are disclosed. In the supporting unit for a substrate and the substrate processing apparatus using the same, because one end of a supporting bar of a supporting member for supporting the central part of a substrate is firmly combined with a supporting board, the other end of the supporting bar does not sag relatively. Because the center pat of the substrate is firmed supported by the supporting bar, the deformation of the substrate can be prevented. In addition, an arm of a robot, which loads the substrate in the supporting unit or unloads the substrate from the supporting unit during moving into and out of the supporting unit, is not interrupted by the supporting bar so that the damage to the supporting unit or the arm of the robot can be prevented.

摘要翻译： 公开了一种用于基板的支撑单元和使用该支撑单元的基板处理装置。 在用于基板的支撑单元和使用其的基板处理装置中，由于用于支撑基板的中心部分的支撑构件的支撑杆的一端与支撑板牢固地组合，所以支撑杆的另一端 不下垂 由于基板的中心拍照被支撑杆支撑，所以可以防止基板的变形。 此外，在移动进出支撑单元的过程中，将基板装载到支撑单元中或从支撑单元卸载基板的机器人的臂不会被支撑杆中断，从而损坏支撑单元 或者可以防止机器人的臂。

公开(公告)号：KR1020130134647A

公开(公告)日：2013-12-10

申请号：KR1020120058305

申请日：2012-05-31

申请人： 엠 에스피 코포레이션

发明人： 리우벤자민와이.에이치. ,  마야민 ,  딘툽엠.

IPC分类号： H01L21/67 ,  C23C16/448 ,  H01L21/205

CPC分类号： H01L21/67011 ,  C23C16/448 ,  H01L21/205

摘要： A vaporizer includes a heating unit which heats a mixture of a liquefied material and a carrier gas and a discharge unit which discharges the heated mixture. The heating unit includes an injection cylinder, a first inner cylinder, a second inner cylinder, and a first coupling unit. The discharge unit includes a second coupling unit, a third inner cylinder, and a discharge cylinder. Thereby, the mixture including the liquefied material used in a chemical vapor deposition process of a semiconductor process is sufficiently vaporized.

摘要翻译： 蒸发器包括加热液化材料和载气的混合物的加热单元和排出加热的混合物的排出单元。 加热单元包括注射缸，第一内筒，第二内筒和第一联接单元。 排出单元包括第二联接单元，第三内筒和排出筒。 因此，包含在半导体工艺的化学气相沉积工艺中使用的液化材料的混合物被充分蒸发。

公开(公告)号：KR1020130103390A

公开(公告)日：2013-09-23

申请号：KR1020130023847

申请日：2013-03-06

申请人： 도쿄엘렉트론가부시키가이샤

发明人： 다나카세이지 ,  시무라아키히코

IPC分类号： H01L21/67

CPC分类号： H01L21/67011 ,  H01L21/02 ,  H01L21/02315 ,  H01L21/0234 ,  H01L21/0273 ,  H01L21/205 ,  H01L21/30621 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/76825 ,  H01L21/76826

摘要： PURPOSE: A method for cooling a component in a chamber and a computer readable storage medium with a component cooling program in the chamber are provided to rapidly cool the component in the chamber by suppressing an atmospheric temperature rise around the component in the chamber. CONSTITUTION: A stage (12) is arranged on the lower side of the inside of a chamber (11). The chamber includes a base (11a) comprising a lower side and a cover (11b) comprising an upper side. A shower head (13) is arranged on the upper side of the inside of the chamber to face the stage. The shower head includes a buffer space (23) and a plurality of gas holes (24) which connect the buffer space to a processing space. An exhaust device (14) exhausts the chamber and is formed by serially connecting a turbo molecular pump (26) to a dry pump (27). [Reference numerals] (18) Heater unit; (20) Temperature sensor unit

摘要翻译： 目的：提供一种用于冷却腔室中的部件的方法和具有在腔室中的部件冷却程序的计算机可读存储介质，以通过抑制腔室中的部件周围的大气温度升高来快速冷却腔室中的部件。 构成：在室（11）的内侧的下侧设置有台（12）。 该腔室包括一个包括下侧的底座（11a）和一个包括上侧的盖（11b）。 淋浴头（13）布置在腔室内侧的上侧以面对台面。 淋浴头包括将缓冲空间连接到处理空间的缓冲空间（23）和多个气孔（24）。 排气装置（14）排出室，并且通过将涡轮分子泵（26）串联连接到干式泵（27）而形成。 （附图标记）（18）加热器单元; （20）温度传感器单元

公开(公告)号：KR1020130085962A

公开(公告)日：2013-07-30

申请号：KR1020130002763

申请日：2013-01-10

申请人： 도쿄엘렉트론가부시키가이샤

发明人： 다나카세이지 ,  사토요시츠토무

IPC分类号： H01L21/67 ,  C23C16/455

CPC分类号： H01L21/67011 ,  C23C16/45565

摘要： PURPOSE: A gas supplying head and a substrate processing apparatus are provided to suppress the generation of unnecessary sediments in the unintended region by sufficiently purging inside the gas expansion room. CONSTITUTION: A gas expansion room (101) is a linear shaped container. Multiple gas discharging holes (102) are arranged in a row corresponding to the gas expansion room. The first gas supplying inlet (103) is arranged at one end portion of the gas expansion room and is connected to the gas system which supplies gas within the gas expansion room. A gas exhausting port (104) is arranged at the other end portion of the gas expansion room and is connected to the gas ventilation system which exhausts the gas from the gas expansion room.

摘要翻译： 目的：提供一种供气头和基板处理装置，以通过在气体膨胀室内充分吹扫来抑制在非预期区域中产生不必要沉积物。 构成：气体膨胀室（101）是线状容器。 多个气体排出孔（102）排列成与气体膨胀室对应的排。 第一气体供给口（103）配置在气体膨胀室的一端部，与在气体膨胀室内供给气体的气体系统连接。 气体排出口（104）配置在气体膨胀室的另一端部，与从气体膨胀室排出气体的排气系统连接。

公开(公告)号：KR1020130037130A

公开(公告)日：2013-04-15

申请号：KR1020110101517

申请日：2011-10-05

申请人： 주식회사 나래나노텍

发明人： 이명근

IPC分类号： G02F1/13 ,  H01L51/56 ,  H01L21/302

CPC分类号： G02F1/1313 ,  G02F1/1303 ,  G02F2001/1316 ,  H01L21/30604 ,  H01L21/67011 ,  H01L51/56

摘要： PURPOSE: A device and a method for collecting the leak fluid of a substrate cleaning apparatus, and the substrate cleaning apparatus and a method thereof are provided to rapidly collect the leak fluid used in a substrate cleaning process by using a suction method and to reduce cleaning time. CONSTITUTION: A cleaning nozzle(230) supplies a cleaning solution onto a substrate(210) mounted on a stage(212). A suction nozzle(240) is provided to the lateral part of the stage. A leak fluid flowing out from the edge part(E1) of the substrate or the outer circumference(C) of the stage is absorbed by a suction nozzle using a suction method. An air suction device(250) is connected to the suction nozzle.

摘要翻译： 目的：提供一种用于收集基板清洗装置的泄漏流体的装置和方法，以及基板清洁装置及其方法，以通过使用抽吸方法快速收集基板清洗过程中使用的泄漏流体并减少清洗 时间。 构成：清洁喷嘴（230）将清洁溶液供应到安装在平台（212）上的基板（210）上。 吸嘴（240）设置在工作台的侧面部分。 从基板的边缘部（E1）或台的外周（C）流出的泄漏流体，通过抽吸法被吸嘴吸收。 吸气装置（250）连接到吸嘴。

公开(公告)号：KR1020130011399A

公开(公告)日：2013-01-30

申请号：KR1020110072537

申请日：2011-07-21

申请人： 삼성전자주식회사

发明人： 김을태 ,  장인배 ,  이희국 ,  장상돈

IPC分类号： H01L21/683 ,  H01L21/67 ,  H01L21/68

CPC分类号： H01L21/67706 ,  H01L21/67011

摘要： PURPOSE: A substrate processing apparatus is provided to reduce the installation space for a supporter by using a bellow assembly. CONSTITUTION: A substrate processing apparatus includes a tray(30) and a lifting device(10). The tray moves up and down to load and unload a substrate on a support. The lifting device moves up and down the tray. The lifting device includes a bellow assembly. The bellow assembly moves the tray up and down.

摘要翻译： 目的：提供一种基板处理装置，通过使用波纹管组件来减小支撑件的安装空间。 构成：基板处理装置包括托盘（30）和提升装置（10）。 托盘上下移动以在支撑件上装载和卸载基板。 提升装置上下移动托盘。 提升装置包括波纹管组件。 波纹管组件上下移动托盘。