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公开(公告)号:KR100599998B1
公开(公告)日:2006-07-13
申请号:KR1020040010042
申请日:2004-02-16
申请人: 도시바세라믹스가부시키가이샤
IPC分类号: C04B35/505
CPC分类号: C04B35/505 , C04B35/62625 , C04B35/6263 , C04B35/62655 , C04B35/63 , C04B35/632 , C04B35/63424 , C04B2235/449 , C04B2235/5436 , C04B2235/5445 , C04B2235/602 , C04B2235/6022 , C04B2235/6027 , C04B2235/604 , C04B2235/6582 , C04B2235/72 , C04B2235/77 , C04B2235/786 , C04B2235/96 , C04B2235/9653 , H01J37/32477
摘要: 평균입경 2㎛이하이고 또한 Y
2 O
3 성분이 99중량%이상의 세라믹원료, 물, 바인더 및 분산제를 적어도 포함하는 액상에, 산을 첨가하여 그 pH를 8.5∼10.5로 조정하는 공정과, 이 액상을 형에 주물하여 주물 성형을 행하는 공정을 적어도 포함하는 Y
2 O
3 주물 성형방법에 의해, 치밀하고 내플라즈마성에 우수하고, 투광성도 기대할 수 있는 Y
2 O
3 소결체를 얻을 수 있다.-
公开(公告)号:KR1020040074014A
公开(公告)日:2004-08-21
申请号:KR1020040010042
申请日:2004-02-16
申请人: 도시바세라믹스가부시키가이샤
IPC分类号: C04B35/505
CPC分类号: C04B35/505 , C04B35/62625 , C04B35/6263 , C04B35/62655 , C04B35/63 , C04B35/632 , C04B35/63424 , C04B2235/449 , C04B2235/5436 , C04B2235/5445 , C04B2235/602 , C04B2235/6022 , C04B2235/6027 , C04B2235/604 , C04B2235/6582 , C04B2235/72 , C04B2235/77 , C04B2235/786 , C04B2235/96 , C04B2235/9653 , H01J37/32477
摘要: PURPOSE: Provided is a Y2O3 sintered body which is dense and has excellent plasma-resistance and transparency and is used as a member of semiconductor processing equipment. And its manufacturing method is also provided. CONSTITUTION: The method for casting Y2O3 comprises the steps of: adding an acid to liquid containing at least a ceramic material having an average diameter of 2 micrometer or less, 99 wt% or more of Y2O3, water, a binder and a dispersant to adjust pH to 8.5-10.5; and injecting the liquid into a mold to cast. The Y2O3 sintered body is manufactured by the steps of: molding a Y2O3 material having a purity of 99 wt% or more and an average particle diameter of 2 micrometer or less; and firing the obtained molded product at a temperature ranging from 1710 deg.C to 1850 deg.C in a hydrogen atmosphere so that Y2O3 crystal having an average crystalline diameter of 10-800 micrometer is formed.
摘要翻译: 目的:提供致密的并具有优异的耐等离子体性和透明性的Y2O3烧结体,并用作半导体加工设备的一部分。 并提供其制造方法。 构成:Y2O3铸造方法包括以下步骤:将至少含有平均粒径为2微米或更小的陶瓷材料的酸添加至Y2O3,水,粘合剂和分散剂的99重量%以上以进行调节 pH至8.5-10.5; 并将液体注入模具铸造。 通过以下步骤制造Y 2 O 3烧结体:将纯度为99重量%以上且平均粒径为2微米以下的Y 2 O 3材料成型; 在氢气氛中,在1710℃〜1850℃的温度下烧成所得成型体,形成平均结晶直径为10-800微米的Y2O3晶体。
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