公开(公告)号：KR1020090084937A

公开(公告)日：2009-08-05

申请号：KR1020097012374

申请日：2007-11-15

Applicant: 메르크 퍼포먼스 마테리알즈 고도가이샤

Inventor： 노야고 ,  고바야시마사카즈 ,  아키야마야스시 ,  구라모토가쓰토시

IPC: G03F7/11 ,  G02B1/11

CPC classification number: G02B1/11 ,  G02B1/118 ,  G03F7/091

Abstract: This invention provides a composition for upper surface antireflection film formation, which prevents pattern failure caused by reflection in a film in an exposure process and is free from a problem of a residue in an etching process, and a method for pattern formation using the same. The composition for upper surface antireflection film formation contains fine particles having a diameter of 1 to 100 nm and a solvent. The method for pattern formation comprises forming an upper surface antireflection film using the composition for upper surface antireflection film formation. The composition and the method can realize the formation of a composite film comprising a resist film and the upper surface antireflection film. ® KIPO & WIPO 2009

Abstract translation: 本发明提供了一种用于上表面抗反射膜形成的组合物，其防止在曝光过程中由膜反射引起的图案故障，并且在蚀刻工艺中没有残留物的问题，以及使用该组合物的图案形成方法。 用于上表面抗反射膜形成的组合物包含直径为1至100nm的细颗粒和溶剂。 图案形成方法包括使用上表面抗反射膜形成用组合物形成上表面抗反射膜。 该组合物和方法可以实现包含抗蚀剂膜和上表面抗反射膜的复合膜的形成。 ®KIPO＆WIPO 2009