公开(公告)号：US4706903A

公开(公告)日：1987-11-17

申请号：US653065

申请日：1984-09-21

Applicant: David L. Brink ,  Michael M. Merriman ,  David A. Mixon

Inventor： David L. Brink ,  Michael M. Merriman ,  David A. Mixon

IPC: B02C13/18 ,  C13K1/02 ,  C13K1/00

CPC classification number: B02C13/18 ,  C13K1/02

Abstract: Apparatus for disintegrating solids resulting from partial hydrolysis of cellulosic or lignocellulosic material comprising a cylindrical chamber having a perforated mid portion and a plurality of hammer elements supported for rotation within and coaxially to the chamber with their tips close to the perforated mid portion of the chamber. This disintegrator may be connected to the lower end of a hydrolyzer to receive the product of hydrolysis from such chamber.

Abstract translation: 用于分解由纤维素或木质纤维素材料部分水解产生的固体的装置，包括具有穿孔中间部分的圆柱形腔室和多个锤元件，所述圆柱形腔室被支撑以在腔室内同轴旋转并且其尖端靠近腔室的穿孔中部。 该崩解剂可以连接到水解器的下端以接收来自该室的水解产物。

公开(公告)号：US5385809A

公开(公告)日：1995-01-31

申请号：US234501

申请日：1994-04-28

Applicant: Michael P. Bohrer ,  David A. Mixon

Inventor： Michael P. Bohrer ,  David A. Mixon

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/033 ,  G03F7/039 ,  G03F7/16 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC classification number: G03F7/26 ,  G03F7/039 ,  G03F7/16 ,  Y10S430/11 ,  Y10S430/111

Abstract: A process for enhancing the performance of resist polymers in lithographic processes for device fabrication is disclosed. The resist polymers contain acid labile functional groups. When these functional groups are removed and replaced by hydrogen, the polymer becomes more soluble in the aqueous base developer solutions used in lithographic processes. A portion of the acid-labile functional groups are cleaved from the polymer to obtain a resist polymer with increased sensitivity, improved adhesion, and reduced film shrinkage during post-exposure bake. The acid labile functional groups are cleaved by dissolving the polymer in a suitable solvent and subjecting the mixture to increased temperature until the desired number of acid labile functional groups are cleaved from the polymer. The polymer is then recovered from the mixture and employed as a resist in a lithographic process for device fabrication.

Abstract translation: 公开了一种用于增强抗蚀剂聚合物在用于器件制造的光刻工艺中的性能的方法。 抗蚀剂聚合物含有酸不稳定官能团。 当这些官能团被氢取代并被氢代替时，该聚合物变得更易溶于用于光刻工艺的碱性显影液。 酸性不稳定官能团的一部分从聚合物中裂解，以获得具有增加的敏感性，改进的粘合性和在曝光后烘烤中降低的膜收缩率的抗蚀剂聚合物。 通过将聚合物溶解在合适的溶剂中并使混合物升高温度直到所需数量的酸不稳定官能团从聚合物中裂解来裂解酸不稳定官能团。 然后从混合物中回收聚合物，并在用于器件制造的光刻工艺中用作抗蚀剂。

公开(公告)号：US06398849B1

公开(公告)日：2002-06-04

申请号：US09566850

申请日：2000-05-08

Applicant: Lisa Carol Green ,  David A Mixon ,  Eric M Monberg

Inventor： Lisa Carol Green ,  David A Mixon ,  Eric M Monberg

IPC: B01D4714

CPC classification number: B01D53/1487 ,  B01D47/14

Abstract: A process deals with gaseous by-products and tarry materials during formation of sol-gel bodies. Gaseous products from a dehydroxylation reactor pass into a gas-fluid contactor. During the early stages of heat treatment, an aqueous acid solution is recirculated through the contactor to trap basic and/or water soluble organic gaseous materials. The resultant solution and non-condensing gases pass into a reservoir. Volatile, undissolved organics exit from the reservoir with non-condensing reactor gases and are treated. Once the organics have burned out of the sol-gel body, recirculation of the aqueous acid solution is ceased, and the gas-fluid contactor is flushed. The water flow is then ceased and dry nitrogen is provided to the contactor. During the next stage of the sol-gel heat treatment, gaseous products from the dehydroxylation reactor pass through the contactor into the caustic scrubber. Once the heat treatment is complete, the contactor is flushed.

Abstract translation: 一个过程在溶胶凝胶体形成期间处理气态副产物和焦油物质。 来自脱羟基化反应器的气态产物进入气液接触器。 在热处理的早期阶段，酸性水溶液通过接触器再循环以捕集碱性和/或水溶性有机气态物质。 所得溶液和非冷凝气体进入储存器。 挥发性，未溶解的有机物从具有非冷凝反应器气体的储层中排出并进行处理。 一旦有机物从溶胶 - 凝胶体中烧掉，酸性水溶液的再循环停止，并且气体 - 流体接触器被冲洗。 然后停止水流，向接触器提供干燥的氮气。 在溶胶 - 凝胶热处理的下一阶段，来自脱羟基反应器的气态产物通过接触器进入苛性碱洗涤器。 一旦热处理完成，接触器就会被冲洗掉。

公开(公告)号：US4935094A

公开(公告)日：1990-06-19

申请号：US358311

申请日：1989-05-26

Applicant: David A. Mixon ,  Anthony E. Novembre

Inventor： David A. Mixon ,  Anthony E. Novembre

IPC: G03F7/027 ,  G03F7/038 ,  H01L21/027

CPC classification number: G03F7/038

Abstract: Polymers formed from monomers such as chloromethyl styrene and trimethylgermylmethyl methacrylate form negative-acting resists that are extremely sensitive to exposure by electron beam and deep UV radiation. These materials are particularly useful in bilevel resist applications for fabricating masks or for device processing.

Abstract translation: 由诸如氯甲基苯乙烯和三甲基甲锗烷基甲基丙烯酸甲酯的单体形成的聚合物形成对由电子束和深紫外线辐射的曝光非常敏感的负性抗蚀剂。 这些材料在制造掩模或器件加工的双层抗蚀剂应用中特别有用。

公开(公告)号：US06732549B1

公开(公告)日：2004-05-11

申请号：US09708148

申请日：2000-11-08

Applicant: Richard M Lum ,  David A Mixon ,  Eric M Monberg ,  Dennis J Trevor

Inventor： Richard M Lum ,  David A Mixon ,  Eric M Monberg ,  Dennis J Trevor

IPC: C03B37027

CPC classification number: C03B19/12 ,  C03B2201/04

Abstract: A process produces a glass overcladding tube from a silica gel body. The process includes passing the gel body through a hot zone under conditions that cause partial sintering of the gel body and repassing the gel body through the hot zone under conditions that further sinter the gel body into a glass overcladding tube.

Abstract translation: 一种工艺从硅胶体制造玻璃外包管。 该方法包括使凝胶体通过热区，在引起凝胶体部分烧结的条件下，并且在将凝胶体进一步烧结成玻璃外包管的条件下，通过热区重新分解凝胶体。