Optical metrology model optimization for process control

    公开(公告)号:US20060247816A1

    公开(公告)日:2006-11-02

    申请号:US11472133

    申请日:2006-06-20

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.

    Optical metrology model optimization for process control
    2.
    发明授权
    Optical metrology model optimization for process control 失效
    用于过程控制的光学计量模型优化

    公开(公告)号:US07065423B2

    公开(公告)日:2006-06-20

    申请号:US10888726

    申请日:2004-07-08

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.

    摘要翻译: 为了评估轮廓模型的适合性,选择用于控制制造过程的一种或多种类型的过程控制。 选择轮廓模型参数和轮廓模型参数的可接受范围。 选择第一和第二计量工具。 设定使用第一和第二工具获得的测量中可接受的变化量的统计度量标准。 选择一个配置文件模型。 使用第一个工具和所选的轮廓模型获得轮廓模型参数的测量。 使用第二工具获得一个或多个轮廓模型参数的测量。 基于使用第一和第二工具获得的一个或多个轮廓模型参数的测量来计算统计度量标准。 将计算和设置的统计度量标准进行比较,以评估所选配置文件模型的适用性。

    Optical metrology model optimization for process control

    公开(公告)号:US20060009872A1

    公开(公告)日:2006-01-12

    申请号:US10888726

    申请日:2004-07-08

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.

    Method for automated determination of an optimally parameterized scatterometry model
    4.
    发明授权
    Method for automated determination of an optimally parameterized scatterometry model 有权
    自动确定最佳参数化散射测量模型的方法

    公开(公告)号:US08666703B2

    公开(公告)日:2014-03-04

    申请号:US12841932

    申请日:2010-07-22

    CPC分类号: G03F7/70616 G03F7/70625

    摘要: Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.

    摘要翻译: 提供了用于分析具有未知参数的样本衍射结构的散射测量模型的优化参数化的自动确定。 预处理器根据多个浮动模型参数确定一组模型参数,该模型参数可以基于从相对于每个参数的测量光谱信息的雅可比确定的每个参数的相对精度,在散射仪模型中合理地浮动。 以考虑组合的参数之间的相关性的方式确定每个参数的相对精度。

    Optical metrology model optimization for process control
    5.
    发明授权
    Optical metrology model optimization for process control 有权
    用于过程控制的光学计量模型优化

    公开(公告)号:US07395132B2

    公开(公告)日:2008-07-01

    申请号:US11804998

    申请日:2007-05-21

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, an initial profile model is selected. The profile model includes profile model parameters to be measured in implementing types of process control to be used in controlling a fabrication process. A measurement of profile model parameters is obtained using a first metrology tool and the profile model. A measurement of the profile model parameters is obtained using a second metrology tool and the profile model. Statistical metric criteria are calculated based on the measurements of the profile model parameters obtained using the first and second metrology tools. When the calculated statistical metric criteria are not within matching requirements, the profile model is revised. When the calculated statistical metric criteria are within matching requirements, the profile model or the revised profile model is stored.

    摘要翻译: 为了评估轮廓模型的适合性,选择初始轮廓模型。 轮廓模型包括在实施用于控制制造过程的过程控制的类型中要测量的轮廓模型参数。 使用第一个计量工具和轮廓模型获得轮廓模型参数的测量。 使用第二计量工具和轮廓模型获得轮廓模型参数的测量。 基于使用第一和第二计量工具获得的轮廓模型参数的测量来计算统计度量标准。 当计算的统计度量标准不在匹配要求中时,修改轮廓模型。 当计算的统计度量标准在匹配要求内时,将存储配置文件模型或修订的配置文件模型。

    METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SCATTEROMETRY MODEL
    6.
    发明申请
    METHOD FOR AUTOMATED DETERMINATION OF AN OPTIMALLY PARAMETERIZED SCATTEROMETRY MODEL 有权
    自动确定最佳参数化模型的方法

    公开(公告)号:US20120022836A1

    公开(公告)日:2012-01-26

    申请号:US12841932

    申请日:2010-07-22

    IPC分类号: G06F17/16

    CPC分类号: G03F7/70616 G03F7/70625

    摘要: Provided is an automated determination of an optimized parameterization of a scatterometry model for analysis of a sample diffracting structure having unknown parameters. A preprocessor determines from a plurality of floating model parameters, a reduced set of model parameters which can be reasonably floated in the scatterometry model based on a relative precision for each parameter determined from the Jacobian of measured spectral information with respect to each parameter. The relative precision for each parameter is determined in a manner which accounts for correlation between the parameters for a combination.

    摘要翻译: 提供了用于分析具有未知参数的样本衍射结构的散射测量模型的优化参数化的自动确定。 预处理器根据多个浮动模型参数确定一组模型参数,该模型参数可以基于从相对于每个参数的测量光谱信息的雅可比确定的每个参数的相对精度,在散射仪模型中合理地浮动。 以考虑组合的参数之间的相关性的方式确定每个参数的相对精度。

    Optical metrology model optimization for process control
    7.
    发明申请
    Optical metrology model optimization for process control 有权
    用于过程控制的光学计量模型优化

    公开(公告)号:US20070225851A1

    公开(公告)日:2007-09-27

    申请号:US11804998

    申请日:2007-05-21

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, an initial profile model is selected. The profile model includes profile model parameters to be measured in implementing types of process control to be used in controlling a fabrication process. A measurement of profile model parameters is obtained using a first metrology tool and the profile model. A measurement of the profile model parameters is obtained using a second metrology tool and the profile model. Statistical metric criteria are calculated based on the measurements of the profile model parameters obtained using the first and second metrology tools. When the calculated statistical metric criteria are not within matching requirements, the profile model is revised. When the calculated statistical metric criteria are within matching requirements, the profile model or the revised profile model is stored.

    摘要翻译: 为了评估轮廓模型的适合性,选择初始轮廓模型。 轮廓模型包括在实施用于控制制造过程的过程控制的类型中要测量的轮廓模型参数。 使用第一个计量工具和轮廓模型获得轮廓模型参数的测量。 使用第二计量工具和轮廓模型获得轮廓模型参数的测量。 基于使用第一和第二计量工具获得的轮廓模型参数的测量来计算统计度量标准。 当计算的统计度量标准不在匹配要求中时,修改轮廓模型。 当计算的统计度量标准在匹配要求内时,将存储配置文件模型或修订的配置文件模型。

    Optical metrology model optimization for process control
    8.
    发明授权
    Optical metrology model optimization for process control 有权
    用于过程控制的光学计量模型优化

    公开(公告)号:US07221989B2

    公开(公告)日:2007-05-22

    申请号:US11472133

    申请日:2006-06-20

    IPC分类号: G06F19/00

    摘要: To evaluate the adequacy of a profile model, one or more types of process control to be used in controlling a fabrication process are selected. Profile model parameters and acceptable ranges for the profile model parameters are selected. A first and second metrology tools are selected. Statistical metric criteria that define an acceptable amount of variation in measurements obtained using the first and second tools are set. A profile model is selected. A measurement of the profile model parameters is obtained using the first tool and the selected profile model. A measurement of the one or more profile model parameters is obtained using the second tool. Statistical metric criteria are calculated based on the measurements of the one or more profile model parameters obtained using the first and second tools. The calculated and set statistical metric criteria are compared to evaluate the adequacy of the selected profile model.

    摘要翻译: 为了评估轮廓模型的适合性,选择用于控制制造过程的一种或多种类型的过程控制。 选择轮廓模型参数和轮廓模型参数的可接受范围。 选择第一和第二计量工具。 设定使用第一和第二工具获得的测量中可接受的变化量的统计度量标准。 选择一个配置文件模型。 使用第一个工具和所选的轮廓模型获得轮廓模型参数的测量。 使用第二工具获得一个或多个轮廓模型参数的测量。 基于使用第一和第二工具获得的一个或多个轮廓模型参数的测量来计算统计度量标准。 将计算和设置的统计度量标准进行比较,以评估所选配置文件模型的适用性。