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    Poly(hydroxystyrene) stain resist
    3.
    发明申请
    Poly(hydroxystyrene) stain resist 审中-公开
    聚（羟基苯乙烯）防污

    公开(公告)号：US20070096052A1

    公开(公告)日：2007-05-03

    申请号：US11261312

    申请日：2005-10-28

    Applicant: Steven Shuey ,  Stephen Jacobson ,  Melea Langley ,  Peter Murphy ,  Mukesh Shah

    Inventor： Steven Shuey ,  Stephen Jacobson ,  Melea Langley ,  Peter Murphy ,  Mukesh Shah

    IPC: D06M15/643

    CPC classification number: D06M15/227 ,  C08F8/36 ,  C08F8/44 ,  D06M15/233 ,  D06M15/263 ,  D06M15/285 ,  D06M15/31 ,  C08F112/14 ,  C08F212/14 ,  C08F2220/1825

    Abstract: A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula 1 having the following repeating units in random sequence wherein R1 is H, methyl or ethyl; R2 and R3 are each independently H, C1 to about C10 alkyl, —COOR4, CONR5R6, or —CN; R4 is M, C1 to about C20 alkyl, or C6 to C10 aryl; R5 and R6 are each independently H, C1 to C10 alkyl, C6 to C10 aryl, or R5 and R6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R7 is a C4 to C8 alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h+i+j+k+n equals 100, and provided that i+j+k+n is greater than zero, except when h is 100%.

    Abstract translation: 用作污渍阻滞剂的组合物及其处理底物的方法，所述组合物包含具有以下无规顺序的重复单元的式1的聚合物，其中R 1是H，甲基或乙基; R 2和R 3各自独立地为H，C 1〜C 10烷基，-COOR 4 ，CONR＆lt; 5＆lt; 6＆lt; 6＆gt;或-CN; R 4是M，C 1〜C 20 C 20烷基，或C 6〜C 10 芳基; R 5和R 6各自独立地为H，C 1至C 10烷基，C 6 C 10芳基或R 5和R 6与氮原子一起形成吗啉，吡咯烷或哌啶环 ; R 7是C 8-14烷基的C 4-14烷基; M是H，碱金属或碱土金属; h为约10至100摩尔％; i为0至约80摩尔％; j为0至约60摩尔％; k和n各自独立地为0至约40摩尔％; m为0.01〜0.5; 只要h + i + j + k + n等于100，并且除了当h为100％时，i + j + k + n大于零。

    Perfluoroamidated and hydrolyzed maleic anhydride copolymers
    5.
    发明申请
    Perfluoroamidated and hydrolyzed maleic anhydride copolymers 审中-公开
    全氟酰胺化和水解马来酸酐共聚物

    公开(公告)号：US20060242766A1

    公开(公告)日：2006-11-02

    申请号：US11115533

    申请日：2005-04-27

    Applicant: Stephen Jacobson ,  Peter Murphy ,  Melea Langley

    Inventor： Stephen Jacobson ,  Peter Murphy ,  Melea Langley

    IPC: C11D3/00

    CPC classification number: D06M15/295 ,  C08F8/00 ,  Y10T428/23986 ,  Y10T428/2933 ,  Y10T428/31725 ,  Y10T428/31786 ,  Y10T442/20 ,  C08F222/06

    Abstract: A composition which provides stain resistance and soil resistance to substrates comprising a copolymer of Formula 1 wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, vinyl ether, allyl ether, alpha olefin and diene; each M is independently H, NH4, Ca, Mg, Al, or a Group I metal; R is H, a C1-C16 alkyl group, or an arylalkyl group; Rf is a fully fluorinated straight or branched C2 to C20 aliphatic radical, or mixture thereof, which is optionally interrupted by at least one oxygen atom; x is 1 to about 10, or a mixture thereof; k and h are each independently a positive integer; i and j are each independently zero or a positive integer, provided that i and j are not both simultaneously zero; the molar ratio of k to (h+i+j) is from about 3:1 to about 1:3, and the molar ratio of h to (i+j) is from about 1:99 to about 22:78 is disclosed.

    Abstract translation: 对包含式1的共聚物的底物提供抗污性和耐污性的组合物，其中D是选自由芳基烯烃，乙烯基醚，烯丙基醚，α-烯烃和二烯组成的组中的至少一种乙烯基单体; 每个M独立地为H，NH 4，Ca，Mg，Al或第I族金属; R为H，C 1 -C 16烷基或芳烷基; R f是完全氟化的直链或支链C 2至C 20脂族基团或其混合物，其任选地被至少一个 氧原子 x为1至约10，或其混合物; k和h各自独立地为正整数; i和j各自独立为零或正整数，条件是i和j不同时为零; k与（h + i + j）的摩尔比为约3:1至约1:3，并且h与（i + j）的摩尔比为约1:99至约22:78 。

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