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13 条记录 (耗时 0.014 秒)

    Vapor collection method and apparatus
    1.
    发明申请
    Vapor collection method and apparatus 有权

    公开(公告)号：US20060191160A1

    公开(公告)日：2006-08-31

    申请号：US11366291

    申请日：2006-03-02

    申请人： Craig Miller ,  Nirmal Jain ,  William Kolb

    发明人： Craig Miller ,  Nirmal Jain ,  William Kolb

    IPC分类号： F26B3/00

    CPC分类号： F26B13/10 ,  F26B13/005 ,  F26B25/006

    摘要： An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.

    DRY CONVERTING PROCESS AND APPARATUS
    3.
    发明申请
    DRY CONVERTING PROCESS AND APPARATUS 有权
    干燥转换工艺和设备

    公开(公告)号：US20070107254A1

    公开(公告)日：2007-05-17

    申请号：US11565353

    申请日：2006-11-30

    申请人： William Kolb

    发明人： William Kolb

    IPC分类号： F26B3/00

    CPC分类号： F26B13/10 ,  F26B13/005 ,  F26B25/006

    摘要： A web converting process and apparatus employing a dry converting station and substrate-handling equipment for conveying the substrate through the dry converting station. The substrate is enveloped in the dry converting station by a close enclosure supplied with one or more streams of conditioned gas flowing at a rate sufficient to reduce materially the particle count in the close enclosure.

    摘要翻译： 采用干燥转化站的纸幅转换处理和装置以及用于通过干燥转化站输送基材的基板处理设备。 衬底被封闭在干燥的转化站中，该封闭的外壳被提供有一个或多个调节气体流，其流速足以在实质上减少封闭壳体中的颗粒数量。

    Method and apparatus for controlling coating width
    4.
    发明申请
    Method and apparatus for controlling coating width 有权
    控制涂层宽度的方法和装置

    公开(公告)号：US20050155549A1

    公开(公告)日：2005-07-21

    申请号：US10760794

    申请日：2004-01-20

    申请人： Mikhail Pekurovsky ,  William Kolb ,  Joan Noyola

    发明人： Mikhail Pekurovsky ,  William Kolb ,  Joan Noyola

    IPC分类号： B05C5/02 ,  B05C1/00 ,  B05C3/02

    CPC分类号： B05C5/0254 ,  Y10S118/02

    摘要： A method of applying a material to a moving substrate is disclosed. The method includes providing a die comprising a die body having a cavity therein, wherein the cavity is in fluid communication with an applicator slot. The die is then oriented such that the applicator slot is positioned so as to dispense the material onto the substrate. The material is introduced into the die cavity such that the material is dispensed onto the substrate through the applicator slot. At least one end of the slot includes means for preventing lateral widening of the dispensed material. In another embodiment, means will be disposed at both ends of the applicator slot. The method is particularly useful when the capillary number characteristic of the coating process is less than 0.5

    摘要翻译： 公开了一种将材料施加到移动的衬底上的方法。 该方法包括提供一种模具，其包括在其中具有空腔的模具主体，其中所述空腔与施加器槽流体连通。 然后将模具定向成使得施加器狭槽定位成将材料分配到基底上。 将材料引入模腔中，使得材料通过施加器槽分配到基底上。 槽的至少一端包括用于防止分配材料的横向加宽的装置。 在另一个实施例中，装置将设置在施放器狭槽的两端。 当涂布过程的毛细管数特性小于0.5时，该方法特别有用

    Vapor collection method and apparatus
    8.
    发明申请
    Vapor collection method and apparatus 有权

    公开(公告)号：US20060179680A1

    公开(公告)日：2006-08-17

    申请号：US11401508

    申请日：2006-04-11

    申请人： Craig Miller ,  Nirmal Jain ,  William Kolb

    发明人： Craig Miller ,  Nirmal Jain ,  William Kolb

    IPC分类号： F26B3/00

    CPC分类号： F26B13/10 ,  F26B13/005 ,  F26B25/006

    摘要： An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.

    Laser plasma tube having a window sealed end and a mirror sealed end
    9.
    发明授权
    Laser plasma tube having a window sealed end and a mirror sealed end 失效
    具有窗口密封端和镜面密封端的激光等离子体管

    公开(公告)号：US5124998A

    公开(公告)日：1992-06-23

    申请号：US525907

    申请日：1990-05-21

    申请人： Marco Arrigoni ,  Gerald C. Barker ,  William Kolb ,  Benjamin Cook ,  Joseph Fraizer

    发明人： Marco Arrigoni ,  Gerald C. Barker ,  William Kolb ,  Benjamin Cook ,  Joseph Fraizer

    IPC分类号： H01S3/034 ,  H01S3/086

    CPC分类号： H01S3/086 ,  H01S3/034

    摘要： A sealed laser plasma tube for use in a gas laser system. A Brewster window seals one end of the tube (the cathode end, in a preferred embodiment), and an end mirror which seals the opposite tube end (the anode end, in a preferred embodiment). In a laser system embodying the invention, a second end mirror is positioned adjacent to, but spaced from, the Brewster window. Intra-cavity elements may conveniently be inserted and replaced in the region between the sealed Brewster window and the second end mirror. The sealed mirror which seals the tube end opposite the window is preferably coated with at least an outermost layer of Hafnium oxide, to protect it from hard UV radiation originating within the plasma tube. The inventors have recognized that the problem of sealed window degradation is substantially less severe at the cathode end of an ion laser plasma tube, and that the sealed window should be attached at the tube end at which the window degradation problem is less severe.

    摘要翻译： 一种用于气体激光系统的密封激光等离子体管。 布鲁斯特窗口密封管的一端（在优选实施例中为阴极端）和密封相对管端（在优选实施例中为阳极端）的端镜。 在体现本发明的激光系统中，第二端镜定位成与布鲁斯特窗相邻但间隔开。 在密封的布鲁斯特窗口和第二端镜之间的区域中可以方便地插入和更换腔内元件。 优选地，密封与窗口相对的管端的密封反射镜至少涂覆有氧化铪的最外层，以保护其免受来自等离子体管内的硬的紫外线辐射。 本发明人已经认识到，在离子激光等离子体管的阴极端处，密封窗口劣化的问题显着地不那么严重，并且密封窗口应该被安装在窗口劣化问题不那么严重的管端。

    APPARATUS FOR CONTROLLING COATING WIDTH
    10.
    发明申请
    APPARATUS FOR CONTROLLING COATING WIDTH 有权
    控制涂层宽度的装置

    公开(公告)号：US20080022930A1

    公开(公告)日：2008-01-31

    申请号：US11865349

    申请日：2007-10-01

    申请人： Mikhail Pekurovsky ,  William Kolb ,  Joan Noyola

    发明人： Mikhail Pekurovsky ,  William Kolb ,  Joan Noyola

    IPC分类号： B05C1/00 ,  B05C3/12 ,  B05B1/14 ,  B05C3/00

    CPC分类号： B05C5/0254 ,  Y10S118/02

    摘要： An apparatus for dispensing a fluid onto a moving substrate is disclosed. In one embodiment, the apparatus is a die comprising a die body having a cavity therein, wherein the cavity is in fluid communication with an applicator slot. The die is then oriented such that the applicator slot is positioned so as to dispense the fluid onto the moving substrate. The fluid is introduced into the die cavity such that the fluid is dispensed onto the moving substrate through the applicator slot. At least one end of the slot includes means for preventing lateral widening of the dispensed fluid. In another embodiment, means are disposed at both ends of the applicator slot. The apparatus is particularly useful when the capillary number characteristic for dispensing the fluid onto the moving substrate is less than 0.5

    摘要翻译： 公开了一种用于将流体分配到移动的衬底上的装置。 在一个实施例中，该装置是包括其中具有空腔的模具主体的模具，其中所述空腔与施加器槽流体连通。 然后将模具定向成使得施加器狭槽被定位成将流体分配到移动的基板上。 将流体引入模腔中，使得流体通过施加器槽分配到移动的基底上。 槽的至少一端包括用于防止所分配流体的横向加宽的装置。 在另一个实施例中，装置设置在施放器狭槽的两端。 当用于将流体分配到移动的衬底上的毛细管数特性小于0.5时，该装置特别有用