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公开(公告)号:US20210269676A1
公开(公告)日:2021-09-02
申请号:US17324921
申请日:2021-05-19
Applicant: AGC Inc.
Inventor: Tomohiro SHIBUYA
Abstract: Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.
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公开(公告)号:US20210079265A1
公开(公告)日:2021-03-18
申请号:US17006236
申请日:2020-08-28
Applicant: AGC Inc.
Inventor: Tomohiro SHIBUYA
Abstract: Smoothness of glass is improved. A polishing slurry (A) contains amorphous carbon and water, and a total amount of the amorphous carbon and the water is equal to or more than 90% of the whole polishing slurry in terms of mass ratio.
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公开(公告)号:US20200095164A1
公开(公告)日:2020-03-26
申请号:US16696835
申请日:2019-11-26
Applicant: AGC INC.
Inventor: Tomohiro SHIBUYA , Shin-ichi AMMA , Yosuke AMINO , Daisuke KOBAYASHI , Michinori SUEHARA
IPC: C03C21/00
Abstract: A glass substrate includes at least one selected from the group consisting of Li, Na, K, Mg, Ca, Sr, Ba and Zn as a reaction factor component, and includes a surface depletion layer at a surface side of the glass substrate. A total molar concentration (mol/cm3) of the reaction factor component in the surface depletion layer is decreased relative to an inside of the glass substrate. A total depletion amount (mol/cm2) of the reaction factor component in the surface depletion layer is 1.00×10−8 or more. The glass substrate has a refractive index (nd) of 1.68 or more.
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