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1.
公开(公告)号:US20200018872A1
公开(公告)日:2020-01-16
申请号:US16504505
申请日:2019-07-08
Applicant: AGC Inc.
Inventor: Kensuke FUJII , Michinori SUEHARA , Kazunari TOHYAMA
Abstract: A glass laminate includes a glass substrate including a first main surface and a second main surface, an antireflection layer on at least one of the first main surface and the second main surface, and an antifouling layer on the antireflection layer. The antireflection layer includes at least one low refractive index layer and at least one high refractive index layer, and the low refractive index layer and the high refractive index layer being alternately laminated. The antireflection layer includes an outermost layer farthest from the glass substrate and the outermost layer is the low refractive index layer including SiO2 as a main component. A distribution of fluorine concentration in a thickness direction of the outermost layer, measured by secondary ion mass spectrometry, has a peak.
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公开(公告)号:US20200095164A1
公开(公告)日:2020-03-26
申请号:US16696835
申请日:2019-11-26
Applicant: AGC INC.
Inventor: Tomohiro SHIBUYA , Shin-ichi AMMA , Yosuke AMINO , Daisuke KOBAYASHI , Michinori SUEHARA
IPC: C03C21/00
Abstract: A glass substrate includes at least one selected from the group consisting of Li, Na, K, Mg, Ca, Sr, Ba and Zn as a reaction factor component, and includes a surface depletion layer at a surface side of the glass substrate. A total molar concentration (mol/cm3) of the reaction factor component in the surface depletion layer is decreased relative to an inside of the glass substrate. A total depletion amount (mol/cm2) of the reaction factor component in the surface depletion layer is 1.00×10−8 or more. The glass substrate has a refractive index (nd) of 1.68 or more.
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3.
公开(公告)号:US20240210814A1
公开(公告)日:2024-06-27
申请号:US18596919
申请日:2024-03-06
Applicant: AGC INC.
Inventor: Hirotomo KAWAHARA , Daijiro AKAGI , Hiroaki IWAOKA , Toshiyuki UNO , Michinori SUEHARA , Keishi TSUKIYAMA
Abstract: The present invention relates to a reflective mask blank for EUV lithography, including: a substrate, a multilayer reflective film reflecting EUV light, and a phase shift film shifting a phase of the EUV light, in which the substrate, the multilayer reflective film, and the phase shift film are formed in this order, the phase shift film includes a layer 1 including ruthenium (Ru) and nitrogen (N), and the layer 1 has an absolute value of a film stress of 1,000 MPa or less.
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4.
公开(公告)号:US20230324785A1
公开(公告)日:2023-10-12
申请号:US18198881
申请日:2023-05-18
Applicant: AGC INC.
Inventor: Hirotomo KAWAHARA , Daijiro AKAGI , Hiroaki IWAOKA , Toshiyuki UNO , Michinori SUEHARA , Keishi TSUKIYAMA
Abstract: The present invention relates to a reflective mask blank for EUV lithography, including: a substrate, a multilayer reflective film reflecting EUV light, and a phase shift film shifting a phase of the EUV light, in which the substrate, the multilayer reflective film, and the phase shift film are formed in this order, the phase shift film includes a layer 1 including ruthenium (Ru) and nitrogen (N), and the layer 1 has an absolute value of a film stress of 1,000 MPa or less.
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公开(公告)号:US20210206691A1
公开(公告)日:2021-07-08
申请号:US17205703
申请日:2021-03-18
Applicant: AGC Inc.
Inventor: Michinori SUEHARA , Yusuke FUJIWARA , Lilin ZHOU
Abstract: The purpose of the present invention is to provide a chemically-strengthened glass exhibiting both surface strength and abrasion-resistant anti-fingerprint (AFP) properties. The present invention relates to a plate-shaped chemically-strengthened glass which has a compressive stress layer provided to a glass surface layer, a glass surface hydrogen concentration profile in a specific range, and a surface strength and abrasion-resistant anti-fingerprint (AFP) properties which are in specific ranges.
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公开(公告)号:US20200376814A1
公开(公告)日:2020-12-03
申请号:US16999263
申请日:2020-08-21
Applicant: AGC Inc.
Inventor: Lilin ZHOU , Kumiko SUWA , Kenji ISHIZEKI , Hideyuki HIRAKOSO , Daisuke KOBAYASHI , Michinori SUEHARA , Mio TOKUNAGA
Abstract: A water/oil repellent layer-provided article, containing a substrate, a water/oil repellent layer containing a hydrolyzed condensate of a fluorinated compound having a hydrolyzable silyl group, and a silicon oxide layer containing alkali metal atoms, present between the substrate and the water/oil repellent layer, where in the silicon oxide layer, the average concentration of the alkali metal atoms in a region with a depth from the surface in contact with the water/oil repellent layer of at least 0.1 nm and at most 0.3 nm, is at least 2.0×1019 atoms/cm3.
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