METHODS FOR TREATING EXHAUST GAS IN A PROCESSING SYSTEM

    公开(公告)号:US20170173521A1

    公开(公告)日:2017-06-22

    申请号:US15449226

    申请日:2017-03-03

    Abstract: Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, a method for treating an exhaust gas in an exhaust conduit of a substrate processing system includes: flowing an exhaust gas and a reagent gas into an exhaust conduit of a substrate processing system; injecting a non-reactive gas into the exhaust conduit to maintain a desired pressure in the exhaust conduit for conversion of the exhaust gas; and forming a plasma from the exhaust gas and reagent gas, subsequent to injecting the non-reactive gas, to convert the exhaust gas to abatable byproduct gases.

    REMOTE PLASMA SOURCE
    2.
    发明申请

    公开(公告)号:US20250118538A1

    公开(公告)日:2025-04-10

    申请号:US18896265

    申请日:2024-09-25

    Abstract: Some embodiments are directed to a remote plasma system. The remote plasma system may include: a first tube; a second tube; a first isolation component coupled between a first end of the first tube and a first end of the second tube; a second isolation component coupled between a second end of the first tube and a second end of the second tube; and a first capacitive element coupled to the first isolation component.

Patent Agency Ranking