公开(公告)号：US20150042017A1

公开(公告)日：2015-02-12

申请号：US14063860

申请日：2013-10-25

Applicant: APPLIED MATERIALS, INC.

Inventor： Kartik RAMASWAMY ,  Troy DETRICK ,  Srinivas NEMANI ,  Ajey JOSHI

IPC: B28B1/00 ,  C23C26/02

CPC classification number: B28B1/001 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2999/00 ,  C23C16/513 ,  C23C26/02 ,  Y02P10/295 ,  B22F2202/13

Abstract: Embodiments include systems, apparatuses, and methods of three-dimensional plasma printing or processing. In one embodiment, a method includes introducing chemical precursors into one or more point plasma sources, generating plasma in the one or more point plasma sources from the chemical precursors with one or more power sources, and locally patterning a substrate disposed over a stage with the generated plasma by moving the stage with respect to the one or more point plasma sources.

Abstract translation: 实施例包括三维等离子体印刷或处理的系统，装置和方法。 在一个实施例中，一种方法包括将化学前体引入一个或多个点等离子体源中，在具有一个或多个电源的化学前体的一个或多个点等离子体源中产生等离子体，以及将设置在舞台上的衬底 通过相对于一个或多个点等离子体源移动台来产生等离子体。