公开(公告)号：US11339476B2

公开(公告)日：2022-05-24

申请号：US17039874

申请日：2020-09-30

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Ippei Yanagisawa ,  Miho Shimotori ,  Makoto Igarashi

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/505 ,  C23C16/455 ,  C23C16/54

Abstract: Examples of a substrate processing device include an annular distribution ring, a plurality of connection plates continued to the distribution ring and having non-uniform impedances, a shower plate electrically connected to the plurality of connection plates, and a stage provided below the shower plate so as to face the shower plate.

公开(公告)号：US20210102289A1

公开(公告)日：2021-04-08

申请号：US17039874

申请日：2020-09-30

Applicant: ASM IP Holding B.V.

Inventor： Naoto Tsuji ,  Ippei Yanagisawa ,  Miho Shimotori ,  Makoto Igarashi

IPC: C23C16/458 ,  C23C16/455 ,  C23C16/505 ,  H01J37/32

Abstract: Examples of a substrate processing device include an annular distribution ring, a plurality of connection plates continued to the distribution ring and having non-uniform impedances, a shower plate electrically connected to the plurality of connection plates, and a stage provided below the shower plate so as to face the shower plate.