公开(公告)号：US20250044715A1

公开(公告)日：2025-02-06

申请号：US18717286

申请日：2022-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Ahmet Burak CUNBUL ,  Ferry ZIJP ,  Teunis Willem TUKKER ,  Peter Fernand William Jozef DENDAS ,  Abraham Franciscus Hubertus VAN GESSEL

IPC: G03F9/00

Abstract: A projection unit for a level sensor, the projection unit including: a first light pipe having a first inlet configured to receive radiation from a source and a first outlet; and a second light pipe having a second inlet configured to receive the radiation from the first light pipe and a second outlet. The unit may include a lens device configured to receive radiation from the second outlet and to output radiation having a predetermined distribution of intensity and irradiance.

公开(公告)号：US20230064193A1

公开(公告)日：2023-03-02

申请号：US17796641

申请日：2021-01-20

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Hugo Augustinus Joseph CRAMER ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Ahmet Burak CUNBUL ,  Alexander Prasetya KONIJNENBERG

IPC: G06T7/00 ,  G01N21/47 ,  G03F7/20 ,  G06T5/00

Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.