METROLOGY METHOD AND DEVICE FOR DETERMINING A COMPLEX-VALUED FIELD

    公开(公告)号:US20220299886A1

    公开(公告)日:2022-09-22

    申请号:US17638975

    申请日:2020-07-31

    IPC分类号: G03F7/20 G01N21/47

    摘要: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.