公开(公告)号：US10146133B2

公开(公告)日：2018-12-04

申请号：US15743273

申请日：2016-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root ,  Herman Philip Godfried ,  Hubertus Petrus Leonardus Henrica Van Bussel ,  Arij Jonathan Rijke ,  Marc Wilhelmus Maria Van Der Wijst ,  Mathijs Leonardus Johan Verhees

IPC: G03F7/20

Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.

公开(公告)号：US09933709B2

公开(公告)日：2018-04-03

申请号：US15507237

申请日：2015-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Herman Philip Godfried ,  Hubertus Petrus Leonardus Henrica Van Bussel ,  Arij Jonathan Rijke ,  Wilhelmus Patrick Elisabeth Maria Op 'T Root

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/20 ,  G03F7/70008 ,  G03F7/70058 ,  G03F7/70358 ,  G03F7/709

Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.