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公开(公告)号：US12124172B2
公开(公告)日：2024-10-22
申请号：US17634702
申请日：2020-08-05
申请人： ASML Holding N.V.
发明人： Alexander Kremer
CPC分类号： G03F7/70558 , G01J3/021 , G01J3/0291 , G01J3/4406 , G03F7/7085
摘要： The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.
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公开(公告)号：US12078934B2
公开(公告)日：2024-09-03
申请号：US17277027
申请日：2019-08-12
CPC分类号： G03F7/70133 , G03F7/70025 , G03F7/70033 , G03F7/70041 , G03F7/70558 , H05G2/008
摘要： Disclosed is a system and method for generating EUV radiation in which a laser is used in a multistage process to illuminate without altering a target material and then irradiate the target material to alter a target material with the illumination stage being used to determine the timing for firing during the irradiation stage or stages.
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公开(公告)号：US20240160110A1
公开(公告)日：2024-05-16
申请号：US18420091
申请日：2024-01-23
发明人： Jasper WINTERS , Erwin John VAN ZWET , Marcus Johannes VAN DER LANS , Pieter Willem Herman DE JAGER , Geerten Frans Ijsbrand KRAMER
IPC分类号： G03F7/00
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/70558
摘要： A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.
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公开(公告)号：US20240126181A1
公开(公告)日：2024-04-18
申请号：US18511454
申请日：2023-11-16
发明人： Abraham SLACHTER , Stefan HUNSCHE , Wim Tjibbo TEL , Anton Bernhard VAN OOSTEN , Koenraad VAN INGEN SCHENAU , Gijsbert RISPENS , Brennan PETERSON
IPC分类号： G03F7/00
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70558 , G03F7/70625
摘要： A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.
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公开(公告)号：US11953835B2
公开(公告)日：2024-04-09
申请号：US17793726
申请日：2020-12-28
发明人： Erwin John Van Zwet
IPC分类号： G03F7/00
CPC分类号： G03F7/70558
摘要： Method of exposing a substrate by a patterned radiation beam, comprising: —providing a radiation beam; —imparting the radiation beam by an array of individually controllable elements; —generating, from the radiation beam, a patterned radiation beam, by tilting the individually controllable elements between different positions about a tilting axis; —projecting the patterned radiation beam towards a substrate; —scanning a substrate across the patterned radiation beam in a scanning direction so as to expose the substrate to the patterned radiation beam, whereby the tilting axis of the individually controllable elements is substantially perpendicular to the scanning direction.
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公开(公告)号：US20240004308A1
公开(公告)日：2024-01-04
申请号：US18021905
申请日：2021-08-03
发明人： Ali ALSAQQA , Aabid PATEL , Patrick Sebastian UEBEL , Amir ABDOLVAND , Paulus Antonius Andreas TEUNISSEN , Wisham F. KADHIM
CPC分类号： G03F7/70625 , G02F1/3523 , G03F7/70041 , G03F7/70558
摘要： A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in the filtered radiation by reducing the energy level of the source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of the source energy pulses by a greater amount than the source energy pulses which have an energy level corresponding to a peak of the energy distribution.
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公开(公告)号：US11822255B2
公开(公告)日：2023-11-21
申请号：US17389842
申请日：2021-07-30
发明人： Abraham Slachter , Stefan Hunsche , Wim Tjibbo Tel , Anton Bernhard Van Oosten , Koenraad Van Ingen Schenau , Gijsbert Rispens , Brennan Peterson
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70558 , G03F7/70625
摘要： A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.
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公开(公告)号：US11709435B2
公开(公告)日：2023-07-25
申请号：US17733664
申请日：2022-04-29
发明人： Shinn-Sheng Yu , Ru-Gun Liu , Hsu-Ting Huang , Kenji Yamazoe , Minfeng Chen , Shuo-Yen Chou , Chin-Hsiang Lin
CPC分类号： G03F7/70641 , G03F7/2004 , G03F7/2022 , G03F7/70558
摘要： A method of manufacturing a semiconductor device includes dividing a number of dies along an x axis in a die matrix in each exposure field in an exposure field matrix delineated on the semiconductor substrate, wherein the x axis is parallel to one edge of a smallest rectangle enclosing the exposure field matrix. A number of dies is divided along a y axis in the die matrix, wherein the y axis is perpendicular to the x axis. Sequences SNx0, SNx1, SNx, SNxr, SNy0, SNy1, SNy, and SNyr are formed. p*(Nbx+1)−2 stepping operations are performed in a third direction and first sequence exposure/stepping/exposure operations and second sequence exposure/stepping/exposure operations are performed alternately between any two adjacent stepping operations as well as before a first stepping operation and after a last stepping operation. A distance of each stepping operation in order follows the sequence SNx.
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公开(公告)号：US20230195000A1
公开(公告)日：2023-06-22
申请号：US18109183
申请日：2023-02-13
发明人： Ming-Hsun LIN , Yu-Hsiang HO , Jhun Hua CHEN , Chi-Hung LIAO , Teng Kuei CHUANG
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70558 , G03F7/70925
摘要： A method is described. The method includes obtaining a relationship between a thickness of a contamination layer formed on a mask and an amount of compensation energy to remove the contamination layer, obtaining a first thickness of a first contamination layer formed on the mask from a thickness measuring device, and applying first compensation energy calculated from the relationship to a light directed to the mask.
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公开(公告)号：US11681228B2
公开(公告)日：2023-06-20
申请号：US16973578
申请日：2018-06-19
发明人： Bernhard Thallner , Boris Povazay
CPC分类号： G03F7/704 , G03F7/2051 , G03F7/70283 , G03F7/70291 , G03F7/70358 , G03F7/70466 , G03F7/70558
摘要： A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.
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