公开(公告)号：US20170285487A1

公开(公告)日：2017-10-05

申请号：US15623091

申请日：2017-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes THOMAS ,  Siebe LANDHEER ,  Arnout Johannes MEESTER ,  Marcio Alexandre Cano MIRANDA ,  Gheorghe TANASA

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.