公开(公告)号：US20170285487A1

公开(公告)日：2017-10-05

申请号：US15623091

申请日：2017-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes THOMAS ,  Siebe LANDHEER ,  Arnout Johannes MEESTER ,  Marcio Alexandre Cano MIRANDA ,  Gheorghe TANASA

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

公开(公告)号：US20150109592A1

公开(公告)日：2015-04-23

申请号：US14586390

申请日：2014-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes THOMAS ,  Siebe Landheer ,  Arnout Johannes Meester ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03B27/52 ,  G03F7/70891

Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

Abstract translation: 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。

公开(公告)号：US20170285489A1

公开(公告)日：2017-10-05

申请号：US15627054

申请日：2017-06-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Siebe LANDHEER ,  Marcel BECKERS ,  Jeroen Peter Johannes BRUIJSTENS ,  Ivo Adam Johannes THOMAS ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

公开(公告)号：US20160054647A1

公开(公告)日：2016-02-25

申请号：US14933956

申请日：2015-11-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Siebe LANDHEER ,  Marcel BECKERS ,  Jeroen Peter Johannes BRUIJSTENS ,  Ivo Adam Johannes THOMAS ,  Franciscus Johannes Joseph JANSSEN

IPC: G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

公开(公告)号：US20130162964A1

公开(公告)日：2013-06-27

申请号：US13686844

申请日：2012-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivo Adam Johannes THOMAS ,  Siebe LANDHEER

IPC: G03F7/20

CPC classification number: G03F7/70641

Abstract: Systems and methods provide the use of a two or three plate Alvarez lens located in a field plane of a projection lens of a lithographic apparatus. The Alvarez lens can be used to modify the shape of the focal plane to match a previously determined surface topography, while at the same time the Alvarez lens can be designed to include a built-in correction for astigmatism and other residual Zernike errors that would otherwise be introduced.

Abstract translation: 系统和方法提供了位于光刻设备的投影透镜的场平面中的两个或三个平板Alvarez透镜的使用。 Alvarez透镜可用于修改焦平面的形状以匹配先前确定的表面形貌，而同时Alvarez透镜可被设计为包括用于散光和其他残留Zernike误差的内置校正 被介绍。