公开(公告)号：US20190250520A1

公开(公告)日：2019-08-15

申请号：US16393055

申请日：2019-04-24

Applicant: ASML Netherlands B.V.

Inventor： Adam Jan URBANCZYK ,  Hans VAN DER LAAN ,  Grzegorz GRZELA ,  Alberto DA COSTA ASSAFRAO ,  Chien-Hung TSENG ,  Jay Jianhui CHEN

IPC: G03F7/20 ,  G01N21/47

Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: obtaining measured target response sequence data relating to a measurement response of a target formed on a substrate by a lithographic process to measurement radiation comprising multiple measurement profiles, wherein the measured target response sequence data describes a variation of the measurement response of the target in response to variations of the measurement profiles; obtaining reference target response sequence data relating to a measurement response of the target as designed to the measurement radiation, wherein the reference target response sequence data describes an optimal measurement response of the target in response to designed measurement profiles without un-designed variation; comparing the measured target response sequence data and the reference target response sequence data; and determining values for variations in stack parameters of the target from the measured target response sequence data based on the comparison.

公开(公告)号：US20210247701A1

公开(公告)日：2021-08-12

申请号：US17053255

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Danying LI ,  Chi-Hsiang FAN ,  Adbalmohsen ELMALK ,  Youping ZHANG ,  Jay Jianhui CHEN ,  Kui-Jun HUANG

IPC: G03F7/20

Abstract: A method for determining a stack configuration for a substrate subjected to a patterning process. The method includes obtaining (i) measurement data of a stack configuration with location information on a printed substrate, (ii) a substrate model configured to predict a stack characteristic based on a location of the substrate, and (iii) a stack map including a plurality of stack configurations based on the substrate model. The method iteratively determines values of model parameters of the substrate model based on a fitting between the measurement data and the plurality of stack configurations of the stack map, and predicts an optimum stack configuration at a particular location based on the substrate model using the values of the model parameters.

公开(公告)号：US20190258172A1

公开(公告)日：2019-08-22

申请号：US16301458

申请日：2017-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Jen-Shiang WANG ,  Jay Jianhui CHEN

IPC: G03F7/20

Abstract: A method including: obtaining a relationship between a performance indicator of a substrate measurement recipe and a parameter of the substrate measurement recipe; deriving a range of the parameter from the relationship, wherein absolute values of the performance indicator satisfy a first condition or a magnitude of variation of the performance indicator satisfies a second condition, when the first parameter is in the range; selecting a substrate measurement recipe that has the parameter in the range; and inspecting a substrate with the selected substrate measurement recipe.