公开(公告)号：US20220100107A1

公开(公告)日：2022-03-31

申请号：US17435115

申请日：2020-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Marcel Pieter Jacobus PEETERS ,  Chien-Hung TSENG ,  Henricus Petrus Maria PELLEMANS

IPC: G03F9/00

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

公开(公告)号：US20190250520A1

公开(公告)日：2019-08-15

申请号：US16393055

申请日：2019-04-24

Applicant: ASML Netherlands B.V.

Inventor： Adam Jan URBANCZYK ,  Hans VAN DER LAAN ,  Grzegorz GRZELA ,  Alberto DA COSTA ASSAFRAO ,  Chien-Hung TSENG ,  Jay Jianhui CHEN

IPC: G03F7/20 ,  G01N21/47

Abstract: Disclosed is a process monitoring method, and an associated metrology apparatus. The method comprises: obtaining measured target response sequence data relating to a measurement response of a target formed on a substrate by a lithographic process to measurement radiation comprising multiple measurement profiles, wherein the measured target response sequence data describes a variation of the measurement response of the target in response to variations of the measurement profiles; obtaining reference target response sequence data relating to a measurement response of the target as designed to the measurement radiation, wherein the reference target response sequence data describes an optimal measurement response of the target in response to designed measurement profiles without un-designed variation; comparing the measured target response sequence data and the reference target response sequence data; and determining values for variations in stack parameters of the target from the measured target response sequence data based on the comparison.

公开(公告)号：US20170191944A1

公开(公告)日：2017-07-06

申请号：US15387610

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV ,  Chien-Hung TSENG ,  Armand Eugene Albert KOOLEN

IPC: G01N21/88 ,  G01N21/95 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/0638 ,  G03F7/70625 ,  G03F7/70641

Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.