公开(公告)号：US11287747B2

公开(公告)日：2022-03-29

申请号：US16983264

申请日：2020-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Patrick Sebastian Uebel ,  Amir Abdolvand ,  Sebastian Thomas Bauerschmidt ,  Peter Maximilian Götz ,  Natallia Eduardauna Uzunbajakava

IPC: G03F7/20

Abstract: A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.

公开(公告)号：US20210063893A1

公开(公告)日：2021-03-04

申请号：US16983264

申请日：2020-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Patrick Sebastian Uebel ,  Amir Abdolvand ,  Sebastian Thomas Bauerschmidt ,  Peter Maximilian Götz ,  Natallia Eduardauna Uzunbajakava

IPC: G03F7/20

Abstract: A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.