公开(公告)号：US11086240B2

公开(公告)日：2021-08-10

申请号：US16470905

申请日：2017-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sebastianus Adrianus Goorden ,  Nitesh Pandey ,  Duygu Akbulut ,  Alessandro Polo ,  Simon Reinaid Huisman

IPC: G01B11/02 ,  G03F9/00 ,  G03F7/20

Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.