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公开(公告)号：US11300892B2
公开(公告)日：2022-04-12
申请号：US17256408
申请日：2019-06-13
Applicant: ASML Netherlands B.V.
Inventor： Simon Reinald Huisman , Alessandro Polo
Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.
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公开(公告)号：US10444638B2
公开(公告)日：2019-10-15
申请号：US16042302
申请日：2018-07-23
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Maxim Pisarenco , Alessandro Polo
IPC: G01N21/00 , G03F7/20 , G01N21/956 , G01N29/06
Abstract: A method and apparatus to measure overlay from images of metrology targets, images obtained using acoustic waves, for example images obtained using an acoustic microscope. The images of two targets are obtained, one image using acoustic waves and one image using optical waves, the edges of the images are determined and overlay between the two targets is obtained as the difference between the edges of the two images.
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公开(公告)号：US10317808B2
公开(公告)日：2019-06-11
申请号：US16069678
申请日：2017-01-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Simon Reinald Huisman , Alessandro Polo , Duygu Akbulut , Sebastianus Adrianus Goorden , Arie Jeffrey Den Boef
Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
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公开(公告)号：US11761929B2
公开(公告)日：2023-09-19
申请号：US17251533
申请日：2019-05-29
Applicant: ASML Netherlands B.V.
Inventor： Alessandro Polo
CPC classification number: G01N29/07 , G01N29/221 , G01N29/2418 , G01N29/28 , G03F9/7053 , G03F9/7084 , G03F9/7088 , G01N2291/044 , G01N2291/2697
Abstract: A sensor apparatus comprising an acoustic assembly arranged to transmit an acoustic signal to a substrate and receive at least part of the acoustic signal after the acoustic signal has interacted with the substrate, a transducer arranged to convert the at least part of the acoustic signal to an electronic signal, and, a processor configured to receive the electronic signal and determine both a topography of at least part of the substrate and a position of a target of the substrate based on the electronic signal. The sensor apparatus may for part of a lithographic apparatus or a metrology apparatus.
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公开(公告)号：US11086240B2
公开(公告)日：2021-08-10
申请号：US16470905
申请日：2017-11-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Sebastianus Adrianus Goorden , Nitesh Pandey , Duygu Akbulut , Alessandro Polo , Simon Reinaid Huisman
Abstract: Disclosed is a metrology sensor system, such as a position sensor. The system comprises an optical collection system configured to collect diffracted or scattered radiation from a metrology mark on a substrate, said collected radiation comprising at least one parameter-sensitive signal and noise signal which is not parameter-sensitive, a processing system operable to process the collected radiation; and a module housing. An optical guide is provided for guiding the at least one parameter-sensitive signal, separated from the noise signal, from the processing system to a detection system outside of the housing. A detector detects the separated at least one parameter-sensitive signal. An obscuration for blocking zeroth order radiation and/or a demagnifying optical system may be provided between the optical guide and the detector.
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Patent Agency Ranking
公开(公告)号：US10585363B2
公开(公告)日：2020-03-10
申请号：US15575069
申请日：2016-03-14
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Alessandro Polo , Patricius Aloysius Jacobus Tinnemans , Adrianus Johannes Hendrikus Schellekens , Elahe Yeganegi Dastgerdi , Willem Marie Julia Marcel Coene , Erik Willem Bogaart , Simon Reinald Huisman
Abstract: An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
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公开(公告)号：US11927891B2
公开(公告)日：2024-03-12
申请号：US16963273
申请日：2018-12-20
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Duygu Akbulut , Alessandro Polo , Sebastianus Adrianus Goorden
IPC: G01N29/11 , G01B9/02015 , G01N29/06 , G03F7/00 , G03F9/00
CPC classification number: G03F9/7061 , G01B9/02015 , G01N29/0681 , G03F7/70625 , G03F7/70633 , G01B2290/25 , G01N2291/2697
Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.
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公开(公告)号：US11333985B2
公开(公告)日：2022-05-17
申请号：US17254601
申请日：2019-06-05
Applicant: ASML Netherlands B.V.
Inventor： Sebastianus Adrianus Goorden , Simon Reinald Huisman , Duygu Akbulut , Alessandro Polo , Johannes Antonius Gerardus Akkermans , Arie Jeffrey Den Boef
IPC: G03F9/00
Abstract: The invention provides a position sensor (300) which comprises an optical system (305,306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.
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公开(公告)号：US20190113452A1
公开(公告)日：2019-04-18
申请号：US16162009
申请日：2018-10-16
Applicant: ASML Netherlands B.V.
Inventor： Maxim Pisarenco , Nitesh Pandey , Alessandro Polo
IPC: G01N21/47 , G01N21/95 , G01N21/956 , G03F7/20
Abstract: An acoustic scatterometer 502 has an acoustic source 520 operable to project acoustic radiation 526 onto a periodic structure 538 and 540 formed on a substrate 536. An acoustic detector 518 is operable to detect the −1st acoustic diffraction order 528 diffracted by the periodic structure 538 and 540 while discriminating from specular reflection (0th order 532). Another acoustic detector 522 is operable to detect the +1st acoustic diffraction order 530 diffracted by the periodic structure, again while discriminating from the specular reflection (0th order 532). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation 526 and location of the detectors 518 and 522 are arranged with respect to the periodic structure 538 and 540 such that the detection of the −1st and +1st acoustic diffraction orders 528 and 530 discriminates from the 0th order specular reflection 532.
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公开(公告)号：US11536654B2
公开(公告)日：2022-12-27
申请号：US17092397
申请日：2020-11-09
Applicant: ASML Netherlands B.V.
Inventor： Maxim Pisarenco , Nitesh Pandey , Alessandro Polo
Abstract: An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.
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