公开(公告)号：US20240369356A1

公开(公告)日：2024-11-07

申请号：US18776207

申请日：2024-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20220107176A1

公开(公告)日：2022-04-07

申请号：US17487896

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/22 ,  H01J37/20 ,  H01J37/21

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20230096657A1

公开(公告)日：2023-03-30

申请号：US17911398

申请日：2021-02-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yan WANG ,  Liang TANG ,  Yixiang WANG

IPC: H01J37/20 ,  H01J37/244 ,  G01B11/06 ,  H01J37/21 ,  H01J37/22

Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.