公开(公告)号：US20200294762A1

公开(公告)日：2020-09-17

申请号：US16650815

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  H01J37/244

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US20220328283A1

公开(公告)日：2022-10-13

申请号：US17638777

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US20220084780A1

公开(公告)日：2022-03-17

申请号：US17533078

申请日：2021-11-22

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  H01J37/244

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US20240402093A1

公开(公告)日：2024-12-05

申请号：US18686369

申请日：2022-08-03

Applicant: ASML Netherlands B.V.

Inventor： Xiaodong MENG ,  Zhiwen KANG ,  Jian ZHANG ,  Kangsheng QIU

IPC: G01N21/95 ,  G01B11/02 ,  G01N21/88 ,  G03F7/00

Abstract: Systems, apparatuses, and methods for detecting a location of a positioned sample may include an electrostatic holder configured to hold a sample and form a gap area between an outside edge of the sample and a structure of the electrostatic holder when the electrostatic holder holds the sample, wherein the gap area is coated with a first coating configured to reflect a first wavelength of light with first brightness and to reflect a second wavelength of the light with second brightness, the first wavelength is within a predetermined range of wavelengths, the second wavelength is outside the predetermined range of wavelengths, and the first brightness is higher than the second brightness; a light source configured to direct the light at the gap area; and an optical detector configured to image the light reflected off the gap area.

公开(公告)号：US20200278524A1

公开(公告)日：2020-09-03

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G02B21/02 ,  H01J37/22 ,  H01J37/28 ,  G02B13/18 ,  G02B9/00

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：US20250037966A1

公开(公告)日：2025-01-30

申请号：US18910626

申请日：2024-10-09

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US20240369356A1

公开(公告)日：2024-11-07

申请号：US18776207

申请日：2024-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20220351932A1

公开(公告)日：2022-11-03

申请号：US17633556

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian ZHANG ,  Ning YE ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/02 ,  G02B27/09

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.

公开(公告)号：US20220107176A1

公开(公告)日：2022-04-07

申请号：US17487896

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/22 ,  H01J37/20 ,  H01J37/21

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20210396683A1

公开(公告)日：2021-12-23

申请号：US17283930

申请日：2019-09-20

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yixiang WANG ,  Zhiwen KANG

IPC: G01N21/95 ,  G01N21/88

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.