公开(公告)号：US10663870B2

公开(公告)日：2020-05-26

申请号：US16061016

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Chen ,  Thomas I. Wallow ,  Bart Laenens ,  Yi-Hsing Peng

IPC: G03F7/20

Abstract: A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.