公开(公告)号：US10663870B2

公开(公告)日：2020-05-26

申请号：US16061016

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Chen ,  Thomas I. Wallow ,  Bart Laenens ,  Yi-Hsing Peng

IPC: G03F7/20

Abstract: A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.

公开(公告)号：US11630396B2

公开(公告)日：2023-04-18

申请号：US17261293

申请日：2019-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Chen

IPC: G03F7/20 ,  H01J37/28 ,  H01L21/66

Abstract: A method for calibrating a process model of a patterning process. The method includes identifying a portion of the substrate that has values within a tolerance band of one or more parameters (e.g., CD, EPE, etc.) of the patterning process, obtaining, via a metrology tool, metrology data corresponding to the portion of the substrate, processing the metrology data, and calibrating a process model based on the processed metrology data.