公开(公告)号：US10754256B2

公开(公告)日：2020-08-25

申请号：US15763387

申请日：2016-10-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas I. Wallow ,  Peng-cheng Yang ,  Adam Lyons ,  Mir Farrokh Shayegan Salek ,  Hermanus Adrianus Dillen

IPC: G03F7/20 ,  G03F1/36

Abstract: A method including providing a plurality of unit cells for a plurality of gauge patterns appearing in one or more images of one or more patterning process substrates, each unit cell representing an instance of a gauge pattern of the plurality of gauge patterns, averaging together image information of each unit cell to arrive at a synthesized representation of the gauge pattern, and determining a geometric dimension of the gauge pattern based on the synthesized representation.

公开(公告)号：US10417359B2

公开(公告)日：2019-09-17

申请号：US15379473

申请日：2016-12-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John Socha ,  Thomas I. Wallow

IPC: G06F17/50 ,  G06N20/00 ,  G01N21/47 ,  G03F7/20 ,  G06F17/18 ,  G06N7/00

Abstract: A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.

公开(公告)号：US11127563B2

公开(公告)日：2021-09-21

申请号：US16730875

申请日：2019-12-30

Applicant: ASML Netherlands B.V.

Inventor： Adam Lyons ,  Thomas I. Wallow

IPC: H01J37/28 ,  H01J37/04 ,  G01N23/06 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/147

Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

公开(公告)号：US11658004B2

公开(公告)日：2023-05-23

申请号：US17480032

申请日：2021-09-20

Applicant: ASML Netherlands B.V.

Inventor： Adam Lyons ,  Thomas I. Wallow

IPC: H01J37/28 ,  H01J37/04 ,  H01J37/147 ,  G01N23/06 ,  G01N23/203 ,  G01N23/2251

CPC classification number: H01J37/28 ,  G01N23/06 ,  G01N23/203 ,  G01N23/2251 ,  H01J37/045 ,  H01J37/1474

Abstract: A method for scanning a sample by a charged particle beam tool is provided. The method includes providing the sample having a scanning area including a plurality of unit areas, scanning a unit area of the plurality of unit areas, blanking a next unit area of the plurality of unit areas adjacent to the scanned unit area, and performing the scanning and the blanking the plurality of unit areas until all of the unit areas are scanned.

公开(公告)号：US10663870B2

公开(公告)日：2020-05-26

申请号：US16061016

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jun Chen ,  Thomas I. Wallow ,  Bart Laenens ,  Yi-Hsing Peng

IPC: G03F7/20

Abstract: A method including obtaining a plurality of gauges of a plurality of gauge patterns for a patterning process, each gauge pattern configured for measurement of a parameter of the patterning process when created as part of the patterning process, and creating a selection of one or more gauges from the plurality of gauges, wherein a gauge is included in the selection provided the gauge and all the other gauges, if any, of the same gauge pattern, or all of the one or more gauges of the same gauge pattern linked to the gauge, pass a gauge printability check.