公开(公告)号：US20200225591A1

公开(公告)日：2020-07-16

申请号：US16633419

申请日：2018-07-18

Applicant: ASML Netherlands B,V. ,  ASML Holding N.V.

Inventor： Han-Kwang NIENHUYS ,  Ronald Peter ALBRIGHT ,  Jacob BRINKERT ,  Yang-Shan HUANG ,  Hendrikus Gijsbertus SCHIMMEL ,  Antonie Hendrik VERWEIJ

IPC: G03F7/20 ,  B01D45/08 ,  B01D45/10

Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

公开(公告)号：US20210173315A1

公开(公告)日：2021-06-10

申请号：US16629337

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

IPC: G03F7/20

Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.