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    PARTICLE SUPPRESSION SYSTEMS AND METHODS
    1.
    发明申请
    PARTICLE SUPPRESSION SYSTEMS AND METHODS 有权

    公开(公告)号：US20210173315A1

    公开(公告)日：2021-06-10

    申请号：US16629337

    申请日：2018-07-18

    申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    发明人： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

    IPC分类号： G03F7/20

    摘要： A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

    RADIATION SYSTEM
    6.
    发明申请
    RADIATION SYSTEM 审中-公开

    公开(公告)号：US20200152345A1

    公开(公告)日：2020-05-14

    申请号：US16743025

    申请日：2020-01-15

    申请人： ASML NETHERLANDS B.V.

    发明人： Han-Kwang NIENHUYS ,  Rilpho Ludovicus Donker ,  Gosse Charles De Vries

    IPC分类号： G21K1/06 ,  G03F7/20 ,  G02B5/02

    摘要： A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Method and Apparatus for Determining a Radiation Beam Intensity Profile
    7.
    发明申请
    Method and Apparatus for Determining a Radiation Beam Intensity Profile 审中-公开

    公开(公告)号：US20200098486A1

    公开(公告)日：2020-03-26

    申请号：US16556603

    申请日：2019-08-30

    申请人： ASML Netherlands B.V.

    发明人： Teis Johan COENEN ,  Han-Kwang NIENHUYS ,  Sandy Claudia SCHOLZ ,  Sander Bas ROOBOL

    IPC分类号： G21K1/06 ,  G01T1/29 ,  G03F7/20

    摘要： Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing relative movement of the diffraction structure relative to the radiation beam from a first position wherein the radiation beam does not irradiate the diffraction structure to a second position wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining the intensity profile of the radiation beam based on the measured diffracted radiation signals.

    Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus
    9.
    发明申请
    Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus 有权
    辐射源组件，相关辐射源和光刻设备

    公开(公告)号：US20160377985A1

    公开(公告)日：2016-12-29

    申请号：US14901941

    申请日：2014-06-17

    申请人： ASML NETHERLANDS B.V.

    发明人： Han-Kwang NIENHUYS

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.

    摘要翻译： 公开了一种用于辐射源的部件，所述辐射源可操作以产生来自燃料的辐射，所述部件具有包括多个第一区域的表面，所述第一区域具有由所述燃料具有高润湿性的第一区域，由具有低润湿性的第二区域分开， 说燃料 所述组件可以包括例如用于液滴发生器或污染物阱的筛选元件。