公开(公告)号：US20210173315A1

公开(公告)日：2021-06-10

申请号：US16629337

申请日：2018-07-18

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Yang-Shan HUANG ,  Marcel Joseph Louis BOONEN ,  Han-Kwang NIENHUYS ,  Jacob BRINKERT ,  Richard Joseph BRULS ,  Peter Conrad KOCHERSPERGER

IPC分类号： G03F7/20

摘要： A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

公开(公告)号：US20150338753A1

公开(公告)日：2015-11-26

申请号：US14409048

申请日：2013-06-13

申请人： ASML Netherlands B.V.

发明人： Michel RIEPEN ,  Dzmitry LEBETSKI ,  Wilbert Jan MESTROM ,  Wim Ronald KAMPINGA ,  Jan Okke NIEUWENKAMP ,  Jacob BRINKERT ,  Henricus Jozef CASTELIJNS ,  Nicolaas TEN KATE ,  Hendrikus Gijsbertus SCHIMMEL ,  Hans JANSEN ,  Dennis Jozef Maria PAULUSSEN ,  Brian Vernon VIRGO ,  Reinier Theodorus Martinus JILISEN ,  Ramin BADIE ,  Albert Pieter RIJPMA ,  Johannes Christiaan Leonardus FRANKEN ,  Peter VAN PUTTEN ,  Gerrit VAN DER STRAATEN

IPC分类号： G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  H05G2/00

CPC分类号： G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

摘要： A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

摘要翻译： 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：US20200225591A1

公开(公告)日：2020-07-16

申请号：US16633419

申请日：2018-07-18

申请人： ASML Netherlands B,V. ,  ASML Holding N.V.

发明人： Han-Kwang NIENHUYS ,  Ronald Peter ALBRIGHT ,  Jacob BRINKERT ,  Yang-Shan HUANG ,  Hendrikus Gijsbertus SCHIMMEL ,  Antonie Hendrik VERWEIJ

IPC分类号： G03F7/20 ,  B01D45/08 ,  B01D45/10

摘要： Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.