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1.发明申请公开(公告)号：US20170261428A1
公开(公告)日：2017-09-14
申请号：US15449367
申请日：2017-03-03
Applicant: ASML Netherlands B.V.
CPC classification number: G01N21/47 , G01N21/33 , G03F7/70625 , G03F7/70633 , G03F9/7092
Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.
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公开(公告)号：US12164233B2
公开(公告)日：2024-12-10
申请号：US17619961
申请日：2020-05-14
Applicant: ASML Netherlands B.V.
Abstract: Disclosed is a method of determining a complex-valued field relating to a sample measured using an imaging system. The method comprises obtaining image data relating to a series of images of the sample, imaged at an image plane of the imaging system, and for which at least two different modulation functions are imposed in a Fourier plane of the imaging system; and determining the complex-valued field from the imaging data based on the imposed modulation functions.
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公开(公告)号：US12117734B2
公开(公告)日：2024-10-15
申请号：US17638975
申请日：2020-07-31
Applicant: ASML Netherlands B.V.
Inventor： Nitesh Pandey , Alexander Prasetya Konijnenberg
CPC classification number: G03F7/70633 , G01N21/4738
Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.
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公开(公告)号：US10234384B2
公开(公告)日：2019-03-19
申请号：US15449367
申请日：2017-03-03
Applicant: ASML Netherlands B.V.
Abstract: Disclosed is a method of obtaining data describing an object structure. The method comprising the steps of: (a) illuminating the object structure with illuminating radiation; (b) modulating the phase of the illuminating radiation after scattering by the object structure, the modulation comprising applying a first phase factor dependent upon at least one controllable parameter and an aberration function having a form of a subadditive function of a vector norm; (c) capturing a plurality of intensity patterns, wherein each intensity pattern corresponds to a unique value of the at least one controllable parameter; and (d) reconstructing the data describing the object structure based on the plurality of intensity patterns. Also disclosed are corresponding inspection and lithographic apparatuses, a method of manufacturing devices and a computer program.
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