HIGH-SPEED AUTOMATIC FILM-FOREIGN SUBSTANCE DETECTION APPARATUS

    公开(公告)号:US20240273707A1

    公开(公告)日:2024-08-15

    申请号:US18563371

    申请日:2022-04-07

    申请人: Jin Ho KIM

    发明人: Jin Ho KIM

    摘要: The present invention provides a high-speed automatic film-foreign substance detection apparatus, including: a stage on which a sample is mounted; a plurality of side light units arranged on an upper side surface of the stage to irradiate side light toward a sample during an operation of a low-magnification optical module; a low-magnification optical module installed at an upper side of the stage and generating a low-magnification image by capturing the sample so that the foreign substance can be detected from the sample using the light scattering of the foreign substance by the side light irradiated from the side light unit; a high-magnification optical module installed at one side of the stage, having a high-magnification driving unit installed and connected thereto to drive in directions of an x-axis, a y-axis and a z-axis, and generating a high-magnification image by capturing the sample; and a user device for controlling the operation of the low-magnification optical module and the high-magnification optical module, and receiving, storing, playing and analyzing the low-magnification image and the high-magnification image.

    APPARATUS AND METHOD FOR IN-SITU OPTICAL INSPECTION OF LASER-INDUCED SURFACE MODIFICATIONS AND LASER PROCESS CONTROL

    公开(公告)号:US20240167948A1

    公开(公告)日:2024-05-23

    申请号:US18395601

    申请日:2023-12-24

    IPC分类号: G01N21/47

    摘要: The embodiments disclose a method for in-situ processing and inspection of an object including utilizing a process laser beam source in a process for a probe light beam source for in-situ inspection of an object surface, impinging at least one process laser pulse onto a target surface region, modifying at least one of the optical, mechanical, or chemical properties of a first region of the surface, generating back-reflected scattered laser light and/or laser light reflected in a specular beam off an illuminated spot on the object surface, generating scattered light emitted in a laser-surface interaction, collecting and measuring the generated scattered light and/or laser light reflected in a specular beam off an illuminated spot, and constructing an image of the modified surface wherein the constructed image is used to adjust laser pulse intensities for predetermined modifications to other regions.

    METROLOGY METHOD FOR MEASURING AN EXPOSED PATTERN AND ASSOCIATED METROLOGY APPARATUS

    公开(公告)号:US20230366815A1

    公开(公告)日:2023-11-16

    申请号:US18021885

    申请日:2021-07-20

    发明人: Jeroen COTTAAR

    IPC分类号: G01N21/47 G01N21/95

    CPC分类号: G01N21/4738 G01N21/9501

    摘要: Disclosed is a method for performing a measurement of an exposed pattern in photoresist on a substrate and an associated metrology device. The method comprises imparting a beam of measurement radiation on said exposed pattern over a measurement area of a size which prevents or mitigates photoresist damage from the measurement radiation; capturing scattered radiation comprising said measurement radiation subsequent to it having been scattered from said exposed pattern and detecting the scattered radiation on at least one detector. A value for a parameter of interest is determined from the scattered radiation.

    METHOD FOR DETECTING BRAIN CONDITION STATE AND A PORTABLE DETECTION SYSTEM THEREOF

    公开(公告)号:US20230293087A1

    公开(公告)日:2023-09-21

    申请号:US18008128

    申请日:2021-06-15

    IPC分类号: A61B5/00 G01N21/47

    摘要: Present disclosure describes the method and system for detecting the brain condition state of a subject. Method comprising calibrating a power zone of the system in real-time and detecting a reflected signal for each of a plurality of transmitted input signals on scanning each of lobe locations of the subject after calibration. Thereafter, method comprising validating an array generated using the plurality of transmitted input signal and corresponding reflected signal for each of the lobe locations and generating a lobe fit value for the validated array using a curve fitting technique. Subsequently, method comprising computing logarithmic ratios corresponding to four pairs of contralateral lobe location, six pairs of ipsilateral lobe locations in left hemisphere and six pairs of ipsilateral lobe locations in right hemisphere using the lobe fit value and classifying the logarithmic ratios into one of brain condition state classes by comparing with pre-labelled logarithmic ratios stored in system.

    EDGE PORTION MEASURING APPARATUS AND METHOD FOR MEASURING EDGE PORTION

    公开(公告)号:US20230258577A1

    公开(公告)日:2023-08-17

    申请号:US18153036

    申请日:2023-01-11

    发明人: Shigeru Oba

    IPC分类号: G01N21/95 G01N21/47 H01L21/66

    摘要: An edge portion measuring apparatus for measuring shape of an edge portion of a wafer, including, a holding portion that holds the wafer, a rotating means for rotating the wafer, a sensor including a light projecting portion for projecting a laser light from a light source onto the edge portion of the wafer held by the holding portion, and a light receiving detection unit receiving diffuse reflected light that the laser light projected is reflected at the edge portion of the wafer, wherein, rotating the wafer while holding the wafer, at least in a range from normal direction of a held surface of the wafer to normal direction of a surface opposite to the held surface, projecting the laser light and detecting the diffuse reflected light by the sensor, being able to measure the shape of an entire area of the edge portion of the wafer by a triangulation method.