公开(公告)号：US11953823B2

公开(公告)日：2024-04-09

申请号：US17266741

申请日：2019-08-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Christopher Alan Spence

IPC: G03F1/36 ,  G03F7/00

CPC classification number: G03F1/36 ,  G03F7/70441 ,  G03F7/705

Abstract: A method of controlling an imaging process uses a qualified optical proximity correction (OPC) model, the process including obtaining an OPC model that is configured to model the behavior of OPC modifications to a pre-OPC design in a process for forming a pattern on a substrate using a post-OPC design in a patterning process, using the patterning process in a manufacturing environment, collecting process control data in substrates patterned using the patterning process in the manufacturing environment, storing the collected process control data in a database, analyzing, by a hardware computer system, the stored, collected process control data to verify that the OPC model is correcting pattern features within a selected threshold, and for pattern features falling outside the selected threshold, determining a modification to the imaging process to correct imaging errors.

公开(公告)号：US10670973B2

公开(公告)日：2020-06-02

申请号：US15573832

申请日：2016-04-29

Applicant: ASML Netherlands B.V.

Inventor： Yi Zou ,  Jing Su ,  Robert John Socha ,  Christopher Alan Spence ,  Duan-Fu Stephen Hsu

IPC: G06F17/50 ,  G03F7/20 ,  G06T7/90 ,  G06T11/00 ,  G06F30/00

Abstract: A method includes obtaining a sub-layout having an area that is a performance limiting spot, adjusting colors of patterns in the area, and determining whether the area is still a performance limiting spot. Another method includes decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub-layouts, the likelihood of that a figure of merit is beyond its allowed range; and if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Another method includes: obtaining a design layout having a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; and co-optimizing at least the first group of patterns, the second group of patterns and an illumination of a lithographic apparatus.