公开(公告)号：US09360774B2

公开(公告)日：2016-06-07

申请号：US13720369

申请日：2012-12-19

Applicant: ASML Netherlands B.V.

Inventor： Johannes Hendrikus Maria Spruit ,  Ruud Antonius Catharina Maria Beerens ,  Richard Henricus Adrianus Van Lieshout ,  Cristian Dan

IPC: G03B27/68 ,  G03B27/54 ,  G03B27/58 ,  G03B27/62 ,  G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70783 ,  G03B27/522 ,  G03F7/7085

Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.

Abstract translation: 公开了一种包括易于变形的构件的光刻设备和用于测量所述构件的变形的变形传感器。 变形传感器包括第一双折射感测元件，其被布置为根据所述构件的变形而受到应力，以及被配置为透射偏振光通过第一双折射感测元件的光系统，其中所述偏振光具有第一偏振态 通过第一双折射检测元件透射。 变形传感器还包括检测器，用于检测通过第一双折射检测元件透射后的偏振光的第二偏振态，以及计算单元，用于基于第一和第二偏振状态确定所述构件的变形。