-
公开(公告)号：US12007693B2
公开(公告)日：2024-06-11
申请号：US17600763
申请日：2020-04-03
Inventor： Ruud Antonius Catharina Maria Beerens , Nico Johannes Antonius Hubertus Boonen , Stefan Michael Bruno Bäumer , Tolga Mehmet Ergin , Andreas Kristian Hopf , Derk Jan Wilfred Klunder , Martin Anton Lambert , Stefan Piehler , Manisha Ranjan , Frank Bernhard Sperling , Andrey Sergeevich Tychkov , Jasper Witte , Jiayue Yuan
CPC classification number: G03F7/70033 , H01S3/0071 , H05G2/008
Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).
-
公开(公告)号：US09470985B2
公开(公告)日：2016-10-18
申请号：US14382230
申请日：2013-02-21
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/7055 , G01J1/0488 , G01J1/429 , G03F7/70558 , G03F7/7085 , G03F7/70958
Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统和传感器。 传感器（S）包括设置在半导体衬底（4）的面（8）上的光电二极管（2），辐射束在光刻设备的操作期间朝向该光电二极管（8），第一辐射阻挡材料（10）围绕 半导体衬底的表面上的光电二极管和第二辐射阻挡材料（12）设置在半导体衬底的侧面（14）处，在光刻设备的操作期间辐射束入射。
-
公开(公告)号：US20150062548A1
公开(公告)日：2015-03-05
申请号：US14382230
申请日：2013-02-21
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/7055 , G01J1/0488 , G01J1/429 , G03F7/70558 , G03F7/7085 , G03F7/70958
Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode (2) provided on a face (8) of a semiconductor substrate (4) towards which the radiation beam is directed during operation of the lithographic apparatus, a first radiation blocking material (10) being provided around the photodiode on the face of the semiconductor substrate, and a second radiation blocking material (12) is provided on a side (14) of the semiconductor substrate upon which the radiation beam is incident during operation of the lithographic apparatus.
Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统和传感器。 传感器（S）包括设置在半导体衬底（4）的面（8）上的光电二极管（2），辐射束在光刻设备的操作期间朝向该光电二极管（8），第一辐射阻挡材料（10）围绕 半导体衬底的表面上的光电二极管和第二辐射阻挡材料（12）设置在半导体衬底的侧面（14）处，在光刻设备的操作期间辐射束入射。
-
-
Search Results
3
records
(took 0.012 seconds)
