公开(公告)号：US20240361222A1

公开(公告)日：2024-10-31

申请号：US18576266

申请日：2022-06-24

Applicant: ASML Netherlands B.V.

Inventor： Dustin Michael Urone ,  Theodorus Wilhelmus Driessen ,  Daniel Jason Riggs ,  Rodney D. Simmons ,  Jaden Robert Bankhead ,  Paul Alexander McKenzie

IPC: G01N15/0205 ,  H05G2/00

CPC classification number: G01N15/0211 ,  H05G2/008

Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.