公开(公告)号：US20240361222A1

公开(公告)日：2024-10-31

申请号：US18576266

申请日：2022-06-24

Applicant: ASML Netherlands B.V.

Inventor： Dustin Michael Urone ,  Theodorus Wilhelmus Driessen ,  Daniel Jason Riggs ,  Rodney D. Simmons ,  Jaden Robert Bankhead ,  Paul Alexander McKenzie

IPC: G01N15/0205 ,  H05G2/00

CPC classification number: G01N15/0211 ,  H05G2/008

Abstract: Disclosed is an apparatus for and method of detecting a droplet of target material in a system for generating EUV radiation in which an illumination system is used to illuminate the droplet of a target material and a detector is arranged to detect radiation from the illumination system that has been forward or side scattered by the droplet of target material.

公开(公告)号：US20240397603A1

公开(公告)日：2024-11-28

申请号：US18690873

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Erik Fernando Huerta ,  Jaden Robert Bankhead ,  Moonseob Jin ,  Paul Alexander McKenzie

IPC: H05G2/00 ,  G02B3/06 ,  G02B13/18 ,  G02B19/00

Abstract: An optical module is configured to pass an optical beam. The optical module includes: a plurality of lenses through which the optical beam passes, the plurality of lenses including at least one aspheric toroid lens; and an optical mount apparatus in which the plurality of lenses is mounted. The plurality of lenses is placed relative to a linearly focused curtain of the optical beam, the linearly focused curtain intersecting a region of interest. The optical mount apparatus is arranged in or fixed to a wall of a chamber of an extreme ultraviolet (EUV) light source such that an optical path is defined that passes through the EUV light source chamber and intersects the region of interest inside the chamber.