公开(公告)号：US11692948B2

公开(公告)日：2023-07-04

申请号：US16963905

申请日：2019-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish Kumar ,  Richard Quintanilha ,  Markus Gerardus Martinus Maria Van Kraaij ,  Konstantin Tsigutkin ,  Willem Marie Julia Marcel Coene

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

CPC classification number: G01N21/956 ,  G02F1/353 ,  G03F1/84 ,  G01N2021/95676 ,  G01N2201/06113

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.

公开(公告)号：US20230296533A1

公开(公告)日：2023-09-21

申请号：US18200947

申请日：2023-05-23

Applicant: ASML Netherlands B.V.

Inventor： Nitish KUMAR ,  Richard Quintanilha ,  Markus Gerardus Martinus Maria Van Kraaij ,  Konstantin Tsigutkin ,  Willem Marie Julia Marcel Coene

IPC: G01N21/956 ,  G02F1/35 ,  G03F1/84

CPC classification number: G01N21/956 ,  G02F1/353 ,  G03F1/84 ,  G01N2021/95676 ,  G01N2201/06113

Abstract: A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation obtained from a high harmonic generation source and having one or more wavelengths within a wavelength range of between 20 nm and 150 nm. Also, a method including performing a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, the second wavelength range comprising wavelengths shorter than the first wavelength range.