公开(公告)号：US12092965B2

公开(公告)日：2024-09-17

申请号：US17313135

申请日：2021-05-06

申请人： ASML Netherlands B.V.

发明人： Venugopal Vellanki ,  Vivek Kumar Jain ,  Stefan Hunsche

IPC分类号： G06F30/20 ,  G03F1/60 ,  G03F1/84 ,  G03F7/00 ,  G06F30/398 ,  G06N20/00 ,  G06F119/18

CPC分类号： G03F7/7065 ,  G03F1/60 ,  G03F1/84 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70641 ,  G03F7/70666 ,  G06F30/398 ,  G06N20/00 ,  G06F30/20 ,  G06F2119/18

摘要： A defect prediction method for a device manufacturing process involving processing one or more patterns onto a substrate, the method including: determining values of one or more processing parameters under which the one or more patterns are processed; and determining or predicting, using the values of the one or more processing parameters, an existence, a probability of existence, a characteristic, and/or a combination selected from the foregoing, of a defect resulting from production of the one or more patterns with the device manufacturing process.

公开(公告)号：US20240295833A1

公开(公告)日：2024-09-05

申请号：US18529068

申请日：2023-12-05

申请人： Carl Zeiss SMT GmbH

发明人： Klaus Edinger ,  Christian Felix Hermanns ,  Tilo Sielaff ,  Jens Oster ,  Christof Baur ,  Maksym Kompaniiets

IPC分类号： G03F7/00 ,  G03F1/84 ,  G06N3/08

CPC分类号： G03F7/70925 ,  G03F1/84 ,  G03F7/70033 ,  G03F7/7085 ,  G06N3/08

摘要： The present application relates to an apparatus and to a method for removing at least a single particulate from a substrate, especially an optical element for extreme ultraviolet (EUV) photolithography, wherein the apparatus comprises: (a) an analysis unit designed to determine at least one constituent of a material composition of the at least one single particulate; and (b) at least one gas injection system designed to provide a gas matched to the particular constituent in an environment of the at least one single particulate; (c) wherein the matched gas contributes to removing the at least one single particulate from the substrate.

公开(公告)号：US12072621B2

公开(公告)日：2024-08-27

申请号：US18185407

申请日：2023-03-17

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

发明人： Chih-Wei Wen ,  Hsin-Fu Tseng ,  Chien-Lin Chen

IPC分类号： G03F1/84 ,  G03F1/86 ,  G03F7/00

CPC分类号： G03F1/84 ,  G03F1/86 ,  G03F7/702 ,  G03F7/70608

摘要： An inspection apparatus includes: a stage configured to receive a photomask; a radiation source configured to inspect the photomask; a mirror configured to direct a first radiation beam from the radiation source to the photomask at a first tilt angle; an aperture stop configured to receive a second radiation beam reflected from the photomask through an aperture of the aperture stop, wherein the aperture is tangent at a center of the aperture stop; and a detector configured to generate an image of the photomask according to the second radiation beam.

公开(公告)号：US20240255843A1

公开(公告)日：2024-08-01

申请号：US18422302

申请日：2024-01-25

申请人： Carl Zeiss SMT GmbH

发明人： Thomas Witkowski

IPC分类号： G03F1/84

CPC分类号： G03F1/84

摘要： Disclosed is a method for examining samples pertaining to microlithography, comprising the following steps:



generating an aerial image of at least one considered region of the sample and generating image structures from the aerial image,
determining distances between a plurality of starting structures present in the aerial image and respective neighboring structures, determining the distances being effected by firstly determining intersection structures intersected by a predetermined intersection line proceeding to from the respective starting structure; in this case, rectangle structures are defined in the considered region for the determination of the intersection structures.

公开(公告)号：US20240201581A1

公开(公告)日：2024-06-20

申请号：US18538977

申请日：2023-12-13

申请人： KLA Corporation

发明人： Patrick Tae ,  Caijun Su

IPC分类号： G03F1/84 ,  G03F1/24 ,  G03F7/00

CPC分类号： G03F1/84 ,  G03F1/24 ,  G03F7/70033

摘要： A broadband light source includes a confocal sensor assembly configured to measure a surface of a rotatable drum coated with plasma-forming target material. The broadband light source includes a laser source configured to direct pulsed illumination to the rotatable drum for exciting the plasma-forming target material and emitting broadband light as the drum is rotated in an angular direction and translated in an axial direction. The broadband light source includes a controller configured to direct the confocal sensor assembly to transmit a confocal optical signal to the rotatable drum, record a calibration measurement of a distance from the confocal sensor assembly to the rotatable drum, direct a cryogenic cooling sub-system to cryogenically cool the rotatable drum, record one or more distance measurements from a sensor head to the rotatable drum, convert the distance measurements to temperature values, and determine whether a target process condition temperature is achieved.

公开(公告)号：US20240134289A1

公开(公告)日：2024-04-25

申请号：US18279694

申请日：2022-02-03

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Bram Paul Theodoor VAN GOCH ,  Johan KUNNEN ,  Sae Na NA

IPC分类号： G03F7/00 ,  G03F1/84

CPC分类号： G03F7/70508 ,  G03F1/84 ,  G03F7/7065

摘要： A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.

公开(公告)号：US11964310B2

公开(公告)日：2024-04-23

申请号：US18093968

申请日：2023-01-06

申请人： Bruker Nano, Inc.

发明人： Tod Evan Robinson ,  Bernabe Arruza ,  Kenneth Gilbert Roessler ,  David Brinkley ,  Jeffrey E. LeClaire

IPC分类号： B08B7/00 ,  B08B1/00 ,  G03F1/82 ,  G03F1/84 ,  G03F7/00 ,  G03F7/20 ,  G01Q20/02 ,  G01Q60/42 ,  G01Q70/12 ,  G01Q80/00

CPC分类号： B08B7/0028 ,  B08B1/00 ,  B08B1/001 ,  G03F1/82 ,  G03F1/84 ,  G03F7/0002 ,  G03F7/70925 ,  G01Q20/02 ,  G01Q60/42 ,  G01Q70/12 ,  G01Q80/00

摘要： A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.

公开(公告)号：US11960202B1

公开(公告)日：2024-04-16

申请号：US17503071

申请日：2021-10-15

申请人： EUV TECH, INC.

发明人： Chami N Perera ,  David C. Houser ,  Charles G. Murray ,  Alexander N. Khodarev ,  Travis W. Grodt

IPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/00

CPC分类号： G03F1/84 ,  G01N21/956 ,  G03F7/7065 ,  G01N2021/95676 ,  G01N2201/061 ,  G01N2201/068

摘要： An EUV microscope device utilizing a source of a beam of EUV light. The light is sent to a collector which produces a first focused EUV beam. A monochromator receives the first focused EUV beam and produces a second EUV beam that is passed to an illumination module. The output of the illumination module is passed to a mask. The reflected beam from the mask is sent to a zone plate and a detector to produce an image.

公开(公告)号：US11899358B2

公开(公告)日：2024-02-13

申请号：US17177411

申请日：2021-02-17

申请人： Carl Zeiss SMT GmbH

发明人： Dmitry Simakov ,  Thomas Thaler ,  Steffen Steinert ,  Dirk Beyer ,  Ute Buttgereit

IPC分类号： G03F1/72 ,  G03F1/84

CPC分类号： G03F1/72 ,  G03F1/84

摘要： The invention relates to a method for measuring a photomask for semiconductor lithography, including the following steps:



recording an aerial image of at least one region of the photomask,
defining at least one region of interest,
ascertaining structure edges in at least one region of interest,
providing desired structures to be produced by the photomask,
adapting the ascertained structure edges to the desired structures, and
displacing the adapted structure edges by means of the results of a separate registration measurement.

公开(公告)号：US20240027922A1

公开(公告)日：2024-01-25

申请号：US18224063

申请日：2023-07-20

申请人： STEK CO., LTD.

发明人： Ming-Sheng Chen

IPC分类号： G03F7/00 ,  G03F1/84

CPC分类号： G03F7/70825 ,  G03F7/70716 ,  G03F7/7085 ,  G03F1/84

摘要： A mask inspection machine includes a platform unit for carrying a transparent container. The transparent container includes a lower window and an upper window. The platform unit includes a platform and a carrier. The platform includes a slot. The carrier is movable on the platform along the slot. The carrier includes a plate and guiding elements. The plate includes a support face including an inspection window corresponding to the lower window of the transparent container. The guiding elements are connected to the support face for guiding the transparent container onto the support face.