公开(公告)号：US20190187568A1

公开(公告)日：2019-06-20

申请号：US16269745

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20170219933A1

公开(公告)日：2017-08-03

申请号：US15500866

申请日：2015-06-30

Applicant: ASML Netherlands B.V.

Inventor： Norbertus Josephus Martinus VAN DEN NIEUWELAAR ,  Victor Manuel BLANCO CARBALLO ,  Casper Roderik DE GROOT ,  Rolf Hendrikus Jacobus CUSTERS ,  David Merritt PHILLIPS ,  Frederik Antonius VAN DER ZANDEN ,  Pieter Lein Joseph GUNTER ,  Erik Henricus Egidius Catharina EUMMELEN ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Marijn WOUTERS ,  Ronald Frank KOX ,  Jorge Alberto VIEYRA SALAS

IPC: G03F7/20 ,  G02B27/00

CPC classification number: G03F7/70341 ,  G02B27/0043 ,  G03F7/2043 ,  G03F7/70358 ,  G03F7/70725 ,  G03F7/70858 ,  G03F7/70925

Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

公开(公告)号：US20180181004A1

公开(公告)日：2018-06-28

申请号：US15738701

申请日：2016-06-16

Applicant: ASML Netherlands B.V.

Inventor： Seerwan SAEED ,  Petrus Martinus Gerardus Johannes ARTS ,  Harold Sebastiaan BUDDENBERG ,  Erik Henricus Egidius Catharina EUMMELEN ,  Giovanni Luca GATTOBIGIO ,  Floor Lodewijk KEUKENS ,  Ferdy MIGCHELBRINK ,  Jeroen Arnoldus Leonardus Johanne RAAYMAKERS ,  Arnoldus Johannes Martinus Jozeph RAS ,  Gheorghe TANASA ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Marijn WOUTERS ,  Miao YU

IPC: G03F7/20 ,  G01N21/95

CPC classification number: G03F7/7085 ,  G01N21/9515 ,  G03F7/70341 ,  G03F7/7065 ,  G03F7/70916 ,  H01L22/12 ,  H01L27/14627 ,  H01L27/14678 ,  H01L27/14862

Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.