-
公开(公告)号：US20190004434A1
公开(公告)日：2019-01-03
申请号：US16063583
申请日：2016-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Artunç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70258 , G03F7/70716 , H01L21/0274
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
-
公开(公告)号：US20210116824A1
公开(公告)日：2021-04-22
申请号：US16981813
申请日：2019-03-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Miao YU , Petrus, Martinus, Gerardus, Jothannes ARTS , Erik, Henricus, Egidius, Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Maarten HOLTRUST , Han, Henricus, Aldegonda LEMPENS , Ferdy MIGCHELBRINK , Theodorus Wilhelmus POLET , Gheorghe TANASA
IPC: G03F7/20
Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.
-
公开(公告)号：US20180181004A1
公开(公告)日：2018-06-28
申请号：US15738701
申请日：2016-06-16
Applicant: ASML Netherlands B.V.
Inventor： Seerwan SAEED , Petrus Martinus Gerardus Johannes ARTS , Harold Sebastiaan BUDDENBERG , Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Floor Lodewijk KEUKENS , Ferdy MIGCHELBRINK , Jeroen Arnoldus Leonardus Johanne RAAYMAKERS , Arnoldus Johannes Martinus Jozeph RAS , Gheorghe TANASA , Jimmy Matheus Wilhelmus VAN DE WINKEL , Daan Daniel Johannes Antonius VAN SOMMEREN , Marijn WOUTERS , Miao YU
CPC classification number: G03F7/7085 , G01N21/9515 , G03F7/70341 , G03F7/7065 , G03F7/70916 , H01L22/12 , H01L27/14627 , H01L27/14678 , H01L27/14862
Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.
-
Patent Agency Ranking
公开(公告)号：US20190137885A1
公开(公告)日：2019-05-09
申请号：US16310537
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate having: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; a sensor configured to generate inspection information relating to a parameter of the component of the apparatus, the sensor embedded in the body; a control detector embedded in the body and configured to detect a control signal transmitted by the apparatus for processing production substrates; and a controller embedded in the body and configured to control the sensor in response to detection of the control signal.
-
公开(公告)号：US20200004162A1
公开(公告)日：2020-01-02
申请号：US16570382
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Arturnç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC: G03F7/20 , H01L21/027
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
-
公开(公告)号：US20190243257A1
公开(公告)日：2019-08-08
申请号：US16343425
申请日：2017-09-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Tiannan GUAN , Jingshi LI , Miao YU
IPC: G03F7/20
CPC classification number: G03F7/70783 , G03F7/70708 , G03F7/70716 , G03F7/708 , G03F7/70825 , G03F7/7085 , G03F7/70875
Abstract: A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.
-
公开(公告)号：US20210181641A1
公开(公告)日：2021-06-17
申请号：US17186117
申请日：2021-02-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Artunç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC: G03F7/20 , H01L21/027
Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
-
公开(公告)号：US20190179230A1
公开(公告)日：2019-06-13
申请号：US16309490
申请日：2017-06-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Pascal Jean Henri BLOEMEN , Petrus Theodorus JUTTE , Arnoldus Johannes Martinus Jozeph RAS , Miao YU
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70775 , G03F7/7085 , G03F7/70916
Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.
-
-
-
-
-
-
-
Search Results
8
records
(took 0.012 seconds)
