公开(公告)号：US20240160108A1

公开(公告)日：2024-05-16

申请号：US18282246

申请日：2022-02-24

Applicant: ASML Netherlands B.V.

Inventor： Nikolaos SOTIROPOULOS ,  Albertus HARTGERS ,  Michael Frederik YPMA ,  Marco Matheus Louis STEEGHS

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70066 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891

Abstract: A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.